Mr. Taejun You Profile

Taejun You

at SK Hynix Inc

SPIE Involvement:

Author

Publications (11)

Proceedings Article | 15 March 2016 Paper

Simple method for decreasing wafer topography effect for implant mask

Taejun You, Taehyeong Lee, Gyun Yoo, Youngjoon Park, Cheolkyun Kim, Donggyu Yim

Proceedings Volume 9780, 97801E (2016) https://doi.org/10.1117/12.2219863

KEYWORDS: Semiconducting wafers, Photomasks, Critical dimension metrology, Reflection, Optical proximity correction, Optical lithography, Dry etching, Buildings, Lithography, Image processing, Data modeling, Visualization, Scanning electron microscopy, Antireflective coatings

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Proceedings Article | 31 March 2014 Paper

Full-chip model-based OPC verification by using rigorous resist 3D model

Dongho Kong, Taejun You, Cheolkyun Kim, Hyunjo Yang, Donggyu Yim

Proceedings Volume 9052, 905220 (2014) https://doi.org/10.1117/12.2046577

KEYWORDS: Data modeling, Semiconducting wafers, 3D modeling, Etching, Chemical mechanical planarization, Scanning electron microscopy, Process modeling, Virtual reality, Wafer inspection, Calibration

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Proceedings Article | 14 December 2009 Paper

Study of OPC accuracy by illumination source types

Kiho Yang, Daejin Park, Jeonkyu Lee, Sangjin Oh, Jinhyuck Jeon, Taejun You, Chanha Park, Donggyu Yim, Sungki Park

Proceedings Volume 7520, 75202A (2009) https://doi.org/10.1117/12.837224

KEYWORDS: Optical proximity correction, Data modeling, Calibration, Lithography, Transistors, Semiconducting wafers, Polarization, Image processing, Process modeling, Scanners

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Proceedings Article | 16 March 2009 Paper

The analysis of polarization characteristics on 40nm memory devices

Minae Yoo, Chanha Park, Taejun You, Hyunjo Yang, Young-Hong Min, Ki-Yeop Park, Donggyu Yim, Sungki Park

Proceedings Volume 7274, 72742W (2009) https://doi.org/10.1117/12.814087

KEYWORDS: Polarization, Critical dimension metrology, Semiconducting wafers, Lithography, Optical lithography, Resolution enhancement technologies, Polarization control, Fiber optic illuminators, Semiconductors, Metrology

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Proceedings Article | 4 December 2008 Paper

Resolution enhancement techniques for contact hole printing of sub-50nm memory device

Hye-Jin Shin, Tae-jun You, Min-Ae Yoo, Jin-Young Choi, Kiho Yang, Chan-Ha Park, Dong-gyu Yim

Proceedings Volume 7140, 714034 (2008) https://doi.org/10.1117/12.804646

KEYWORDS: SRAF, Diffractive optical elements, Resolution enhancement technologies, Photoresist processing, Lithography, Printing, Source mask optimization, Fiber optic illuminators, Semiconducting wafers, Optical lithography

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Proceedings Article | 20 May 2006 Paper

The study of contact hole for 65nm node with KrF

Tae-Jun You, Sung-Woo Ko, James Moon, Yeong-Bae Ahn, Byung-Ho Nam, Dong-Gyu Yim

Proceedings Volume 6283, 628336 (2006) https://doi.org/10.1117/12.681825

KEYWORDS: SRAF, Optical lithography, Photomasks, Optical proximity correction, Resolution enhancement technologies, Lithographic illumination, Lithography, Light sources, Phase shifts, Manufacturing

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Proceedings Article | 26 June 2003 Paper

Sub-100-nm DRAM cell patterning results and relation with lens aberration at 248-nm lithography era

Tae-Jun You, Hyeong-Soo Kim, Jin-Soo Kim, Seok-Kyun Kim, Young-Deuk Kim, Hyeong Sun Youn, Keun-Kyu Kong

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485331

KEYWORDS: Lithography, Reticles, Optical lithography, Lithographic illumination, Monochromatic aberrations, Semiconducting wafers, Resolution enhancement technologies, Chemical mechanical planarization, Photoresist processing, Image processing

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Proceedings Article | 26 June 2003 Paper

Printing 95-nm DRAM full chip patterns in KrF lithography

Seok-Kyun Kim, Jin-Soo Kim, Tae-Jun Yoo, Keun-Kyu Kong, Hyoung-Soon Yun, Young-Deuk Kim, Hyoung-Ryeun Kim, Young-Sik Kim, Hyeong-Soo Kim

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485435

KEYWORDS: Lithography, Lithographic illumination, Photomasks, Photoresist processing, Printing, Etching, Semiconducting wafers, Critical dimension metrology, Forward error correction, Optical proximity correction

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Proceedings Article | 2 June 2003 Paper

Analysis of total CD uniformity at sub-100-nm DRAM patterning by using KrF lithography

Young-Sik Kim, Tae Jun You, Jin-Soo Kim, Seok-Kyun Kim, Keun-Kyu Kong, Young-Deuk Kim, HyeongSoo Kim

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.485009

KEYWORDS: Photomasks, Lithography, Semiconducting wafers, Optical lithography, Forward error correction, Chemical mechanical planarization, Lithographic illumination, Photoresist processing, Monochromatic aberrations, Critical dimension metrology

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Proceedings Article | 16 July 2002 Paper

CD metrology for avoiding shrinkage of ArF resist patterns in 100 nm ArF lithography

Tae-Jun You, Cheol-Kyu Bok, Ki-Soo Shin

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473516

KEYWORDS: Scanning electron microscopy, Critical dimension metrology, Lithography, Line edge roughness, Photoresist processing, Time metrology, Etching, Semiconductors, Coating, Resistance

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Proceedings Article | 14 September 2001 Paper

Feasibility study of printing sub-100-nm with ArF lithography

Seok-Kyun Kim, Jong-Gyun Hong, Joo-On Park, Tea-Jun Yoo, Yoon-Suk Hyun, Cheol-Kyu Bok, Ki-Soo Shin

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435721

KEYWORDS: Lithography, Resolution enhancement technologies, Photomasks, Printing, Optical lithography, Photoresist processing, Lithographic illumination, Etching, Data modeling, Transistors

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Showing 5 of 11 publications

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