We have developed a solid-state 193-nm laser source operating at 5-kHz that generates a near-diffraction-limited TEM00
beam with 35 mW average power. The frequency spectrum is Gaussian, with a linewidth ~7-pm (FWHM),
corresponding to a coherence length of ~2-mm. The output beam also has a very high degree of spatial coherence. This
source was used in an interferometric liquid-immersion lithography test stand to produce 40- and 35-nm half-pitch
grating structures over a ~0.6-mm field of view with a commercially available chemically-amplified photoresist.
Acintic measurements of optical transmission are critical for determining the quality of repairs on advanced ArF- generation photomasks. We describe a new 193 nm tool designed to provide mask makers and uses the capability to resolve and measure photomask features with dimensions less than 0.20 micron. Measurements of transmission with sub-1 percent error are achieved in 30 seconds by using a laser probe beam imaged onto the top of the mask surface. We present high-resolution actinic images of embedded attenuator phase shift masks and of binary masks and discuss various methods and results of measuring mask transmission. A scheme to add phase retardation measurement capability to the tool is described, and preliminary results are discussed.
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