CONFERENCE PROCEEDINGS
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Tung-Yaw Kang
at Taiwan Semiconductor Manufacturing Co Ltd
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Publications (3)
Proceedings Article | 29 March 2011 Paper
Mask registration impact on intrafield on-wafer overlay performance
Proceedings Volume 7971, 797106 (2011) https://doi.org/10.1117/12.879485
KEYWORDS: Photomasks, Semiconducting wafers, Overlay metrology, Scanners, Image registration, Error analysis, Optical lithography, Lithography, Double patterning technology, Reticles
Proceedings Article | 17 October 2008 Paper
Auto-classification and simulation of mask defects using SEM and CAD images
Tung-Yaw Kang, Hsin-Chang Lee, H. Zhang, K. Yamada, Y. Kitayama, K. Kobayashi, Peter Fiekowsky
Proceedings Volume 7122, 71221F (2008) https://doi.org/10.1117/12.801411
KEYWORDS: Inspection, Photomasks, Scanning electron microscopy, Computer aided design, Semiconducting wafers, Printing, Defect detection, Defect inspection, Holons, Lithography
Proceedings Article | 29 May 2007 Paper
High-performance reticle inspection tool for the 65-nm node and beyond
Tung-Yaw Kang, Chia-Hsien Chen, Chia Hui Ho, Luke Hsu, Yao-Ching Ku, Kazuyoshi Nakamura, Hideyuki Moribe, Takeshi Bashomatsu, Kenichi Matsumura, Keiichi Hatta, Hiroyuki Takahashi, Akira Uehara, Takahiro Igeta, Hiroshi Uno, Ryou Igarashi, Hiroaki Matsuda
Proceedings Volume 6607, 660716 (2007) https://doi.org/10.1117/12.728955
KEYWORDS: Inspection, Reticles, Photomasks, Semiconducting wafers, Defect detection, Particles, Defect inspection, Sensors, Deep ultraviolet, Resolution enhancement technologies
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