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Vincent Pici
Business Development Manager at ASML US Inc
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Publications (1)
Proceedings Article | 20 October 2006 Paper
Application of Dosemapper for 65-nm gate CD control: strategies and results
Nazneen Jeewakhan, Nader Shamma, Sang-Jun Choi, Roque Alvarez, D. Son, Makoto Nakamura, Vinny Pici, Jim Schreiber, Wei-shun Tzeng, Sean Ang, Daniel Park
Proceedings Volume 6349, 63490G (2006) https://doi.org/10.1117/12.692938
KEYWORDS: Etching, Critical dimension metrology, Semiconducting wafers, Charge-coupled devices, Lithography, Tolerancing, Reticles, Manufacturing, Neodymium, Photomasks
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