Dr. Vivek Kapila Profile

Dr. Vivek Kapila

at SUNY Poly SEMATECH

SPIE Involvement:

Author

Publications (8)

Proceedings Article | 1 April 2008 Paper

Sub 50 nm cleaning-induced damage in EUV mask blanks

Abbas Rastegar, Sean Eichenlaub, Vivek Kapila, Arun John Kadaksham, Pat Marmillion

Proceedings Volume 6921, 692120 (2008) https://doi.org/10.1117/12.774951

KEYWORDS: Glasses, Cavitation, Particles, Extreme ultraviolet, Surface finishing, Acoustics, Quartz, Inspection, Photomasks, Atomic force microscopy

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Proceedings Article | 16 November 2007 Paper

A method to determine the origin of remaining particles after mask blank cleaning

Vivek Kapila, Sean Eichenlaub, Abbas Rastegar, Arun John, Pat Marmillion

Proceedings Volume 6730, 67304L (2007) https://doi.org/10.1117/12.746798

KEYWORDS: Particles, Quartz, Scanning probe microscopy, Photomasks, Chemistry, Extreme ultraviolet lithography, Liquids, Mask cleaning, Ions, Vacuum ultraviolet

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Proceedings Article | 15 March 2007 Paper

New requirements for the cleaning of EUV mask blanks

Abbas Rastegar, Sean Eichenlaub, Vivek Kapila, Arun John Kadaksham, Pat Marmillion

Proceedings Volume 6517, 65171D (2007) https://doi.org/10.1117/12.712105

KEYWORDS: Particles, Extreme ultraviolet, Quartz, Atomic force microscopy, Glasses, Inspection, Iron, Gold, Aluminum, Surface finishing

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Proceedings Article | 20 October 2006 Paper

Cleaning of MoSi multilayer mask blanks for EUVL

Vivek Kapila, Abbas Rastegar, Yoshiaki Ikuta, Sean Eichenlaub, Pat Marmillion

Proceedings Volume 6349, 63492W (2006) https://doi.org/10.1117/12.686556

KEYWORDS: Photomasks, Particles, Multilayers, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, Silicon, Quartz, Deposition processes, Chemistry

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Proceedings Article | 20 October 2006 Paper

Dependency of EUV mask defects on substrate defects

Sean Eichenlaub, Abbas Rastegar, Vivek Kapila, Yoshiaki Ikuta, Pat Marmillion

Proceedings Volume 6349, 63493C (2006) https://doi.org/10.1117/12.686437

KEYWORDS: Particles, Inspection, Scanning probe microscopy, Extreme ultraviolet, Defect inspection, Multilayers, Deposition processes, Scanning electron microscopy, Atomic force microscopy, Defect detection

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Proceedings Article | 20 May 2006 Paper

Megasonic cleaning, cavitation, and substrate damage: an atomistic approach

Vivek Kapila, Pierre Deymier, Hrishikesh Shende, Viraj Pandit, Srini Raghavan, Florence Eschbach

Proceedings Volume 6283, 628324 (2006) https://doi.org/10.1117/12.681771

KEYWORDS: Cavitation, Liquids, Acoustics, Chemical species, Particles, Photomasks, Systems modeling, Extreme ultraviolet, Argon, Acoustic cavitation

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Proceedings Article | 8 November 2005 Paper

Acoustic streaming effects in megasonic cleaning of EUV photomasks: a continuum model

Vivek Kapila, Pierre Deymier, Hrishikesh Shende, Viraj Pandit, Srini Raghavan, Florence Eschbach

Proceedings Volume 5992, 59923X (2005) https://doi.org/10.1117/12.633378

KEYWORDS: Particles, Acoustics, Photomasks, Interfaces, Extreme ultraviolet lithography, Silica, Extreme ultraviolet, Cavitation, Microfluidics, Wave propagation

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Proceedings Article | 12 July 1999 Paper

Strain monitoring by evanascent wave spectroscopy

Vivek Kapila, Lidvin Kjerengtroen, William Cross, F. Johnson, Jon Kellar

Proceedings Volume 3675, (1999) https://doi.org/10.1117/12.352789

KEYWORDS: Absorbance, Fiber optics sensors, Composites, Sensors, Infrared spectroscopy, Wave sensors, Absorption, Spectroscopy, Polymers, Infrared radiation

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Showing 5 of 8 publications

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