Dr. Weijie Shi Profile

Dr. Weijie Shi

at Shanghai Institute of Optics and Fine Mechanics

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 19 May 2006 Paper

Method for measuring the granite surface topography of wafer stage with laser interferometer

Le He, Xiangzhao Wang, Weijie Shi, Jianming Hu

Proceedings Volume 6150, 615008 (2006) https://doi.org/10.1117/12.676906

KEYWORDS: Semiconducting wafers, Interferometers, Lithography, Time metrology, Wafer-level optics, Optical lithography, Optical testing, Tolerancing, Interferometry, Metrology

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Proceedings Article | 19 May 2006 Paper

Coma aberration measurement by lateral image displacements at different defocus positions

Mingying Ma, Xiangzhao Wang, Fan Wang, Weijie Shi, Dongqing Zhang

Proceedings Volume 6150, 615003 (2006) https://doi.org/10.1117/12.676894

KEYWORDS: Monochromatic aberrations, Projection systems, Lithography, Optical lithography, Coherence (optics), Semiconducting wafers, Fluctuations and noise, Optical alignment, Ray tracing, Optical testing

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SPIE Journal Paper | 1 May 2006

Method for measuring the lateral aberrations of a lithographic projection system with mirror-symmetric FOCAL marks

Weijie Shi, Xiangzhao Wang, Dongqing Zhang, Osami Sasaki

OE, Vol. 45, Issue 05, 053201, (May 2006) https://doi.org/10.1117/12.10.1117/1.2202917

KEYWORDS: Adaptive optics, Optical alignment, Projection systems, Lithography, Semiconducting wafers, Imaging systems, Image quality, Distortion, Monochromatic aberrations, Optical engineering

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Proceedings Article | 27 January 2005 Paper

Application of BP-neural networks in the FOCAL technique

Weijie Shi, Xiangzhao Wang, Dongqing Zhang, Fan Wang, Mingying Ma

Proceedings Volume 5645, (2005) https://doi.org/10.1117/12.573822

KEYWORDS: Neural networks, Neurons, Monochromatic aberrations, Optical alignment, Semiconducting wafers, Lithography, Artificial neural networks, Evolutionary algorithms, Adaptive optics, Imaging systems

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Proceedings Article | 27 January 2005 Paper

A new method to determine the energy range for the FOCAL technique

Dongqing Zhang, Xiangzhao Wang, Weijie Shi, Fan Wang, Liping Guo, Jianming Hu, Mingying Ma, Le He

Proceedings Volume 5645, (2005) https://doi.org/10.1117/12.573815

KEYWORDS: Adaptive optics, Image quality, Semiconducting wafers, Optical alignment, Lithography, Calibration, Monochromatic aberrations, Line width roughness, Photoresist processing, Optical lithography

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Proceedings Article | 27 January 2005 Paper

Coma measurement by transmission image sensor with a PSM

Fan Wang, Xiangzhao Wang, Mingying Ma, Dongqing Zhang, Weijie Shi, Jianming Hu

Proceedings Volume 5645, (2005) https://doi.org/10.1117/12.573642

KEYWORDS: Monochromatic aberrations, Binary data, Photomasks, Phase shifting, Image sensors, Diffraction, Coherence (optics), Wavefronts, Resolution enhancement technologies, Semiconducting wafers

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Showing 5 of 6 publications

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