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Wenhong Zhou
at Shanghai Institute of Technical Physics
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Publications (1)
Proceedings Article | 9 February 2009 Paper
A study of Hg1-xCdxTe surfaces processed using inductively coupled plasma with CH4/H2/N2/Ar mixture
Proceedings Volume 7158, 71581B (2009) https://doi.org/10.1117/12.807068
KEYWORDS: Plasma, Etching, Mercury cadmium telluride, Plasma etching, Dry etching, Atomic force microscopy, Scanning probe microscopy, Reactive ion etching, Chemical analysis, Argon
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