A 1064 nm, 1 mJ pulsed fiber MOPA module, housed in 16”x14”x2.5” package for application in a lunar and planetary in-situ surface dating instrument is demonstrated. The module is based on a three-stage MOPA with a 60 μm core tapered fiber terminal amplifier. The master oscillator and first two preamplifier stages, which generate 20 μJ pulses, are all contained on a 13”x11”x1” board. Several improvements to the electronic signal control were instrumental to the laser development, including bipolar drive of the phase modulator for SBS suppression, shaping of the seed pulse to compensate pulse steepening, and pulsed operation of the power amplifier pump to reduce spontaneous emission at low pulse repetition frequency. The packaged laser runs at a repetition rate of 10 kHz and generates 10 ns pulses at 1 mJ with a 40 GHz linewidth, an M2 ~ 1.2 beam quality, and an 18 dB polarization extinction ratio. The modular design enables seven independent lasers to be stacked in a 20”x18”x16.25” enclosure, supporting a path towards a fiber laser based LARIMS for advanced materials characterization and chronological dating in harsh and remote environments.
The end performance of semiconductor optoelectronic devices is largely determined by the carrier dynamics of the constituent base materials. When combined with full-scale numerical models, optical spectroscopy is capable of providing detailed information about carrier generation and dynamics that is essential to accurate analysis of empirical test structure studies, and to translating those results into predictions for device performance. We have applied time-resolved and steady-state luminescence techniques to a variety of III-V materials and reference structures in order to investigate the mechanisms controlling carrier dynamics and to develop diagnostic tools to provide actionable feedback to R and D efforts for improvement and optimization of material/device performance.
We use steady-state and time-resolved spectroscopy to evaluate optoelectronic material quality and obtain detailed information about carrier generation, transport, and relaxation in semiconductor devices and test structures. This report focuses on time-resolved and steady-state photoluminescence of III-V reference heterostructures at temperatures between 4K and 300K in order to investigate the mechanisms limiting carrier lifetime and to develop the capability to provide actionable feedback to research-and-development efforts for improvement and optimization of material properties and/or device performance. We combine the results of photoluminescence experiments with model-based analyses and simulations of carrier relaxation to assess the impacts of defects and interface quality on the relaxation dynamics of photo-generated carriers in double heterostructure test vehicles grown by MOCVD and MBE.
We demonstrate high power, deep ultraviolet (DUV) conversion to 266 nm through frequency quadrupling of a nanosecond pulse width 1064 nm fiber master oscillator power amplifier (MOPA). The MOPA system uses an Yb-doped double-clad polarization-maintaining large mode area tapered fiber as the final gain stage to generate 0.5-mJ, 10 W, 1.7- ns single mode pulses at a repetition rate of 20 kHz with measured spectral bandwidth of 10.6 GHz (40 pm), and beam qualities of Mx2=1.07 and My2=1.03, respectively. Using LBO and BBO crystals for the second-harmonic generation (SHG) and fourth-harmonic generation (FHG), we have achieved 375 μJ (7.5 W) and 92.5 μJ (1.85 W) at wavelengths of 532 nm and 266 nm, respectively. To the best of our knowledge these are the highest narrowband infrared, green and UV pulse energies obtained to date from a fully spliced fiber amplifier. We also demonstrate high efficiency SHG and FHG with walk-off compensated (WOC) crystal pairs and tightly focused pump beam. An SHG efficiency of 75%, FHG efficiency of 47%, and an overall efficiency of 35% from 1064 nm to 266 nm are obtained.
AlGaN-GaN high electron mobility transistors (HEMTs) are most suitable for commercial and military applications requiring high voltage, high power, and high efficiency operation. In recent years, leading AlGaN HEMT manufacturers have reported encouraging reliability of these devices, but their long-term reliability especially in the space environment still remains a major concern. In addition, degradation mechanisms in AlGaN HEMT devices are still not well understood, and a large number of traps and defects present both in the bulk and at the surface lead to undesirable characteristics. Study of reliability and radiation effects of AlGaN-GaN HEMTs is therefore necessary before GaN HEMT technology is successfully employed in satellite communication systems. For the present study, we investigated electrical characteristics of AlGaN-GaN HEMTs and AlGaN Schottky diodes irradiated with protons. We studied two types of MOCVD-grown AlGaN HEMTs on semi-insulating SiC substrates (HEMT-1 and HEMT-2) as well as MOCVD-grown Al0.27Ga 0.73N Schottky diodes on conducting SiC substrates. Our HEMT-1 structure consisted of a GaN cap, AlGaN/AlN barrier, and 2 μm GaN buffer layers. Our HEMT-2 structure consisting of undoped AlGaN barrier and GaN buffer layers grown on an AlN nucleation layer showed a charge sheet density of ~1013/cm2 and a Hall mobility of ~1500 cm2 /V.sec. Our HEMT-1 devices had a Pt-Au Schottky gate length of 0.2 μm, a total gate width of 200-400 μm periphery, and SiNx passivation. Electrical characteristics of AlGaN-GaN HEMTs and AlGaN Schottky diodes were compared before and after they were proton irradiated with different energies and fluences. Current-mode deep level transient spectroscopy (DLTS) and capacitance-mode DLTS were employed to study pre-proton irradiation trap characteristics in the AlGaN-GaN HEMTs and AlGaN Schottky diodes, respectively. Focused ion beam (FIB) was employed to prepare both cross-sectional and plan view TEM samples for defect analysis using a high resolution TEM. In addition, electrical characteristics of GaAs MESFETs used as reference devices were compared before and after they were proton irradiated.
A number of groups have studied reliability and degradation processes in GaAs-based lasers, but none of these studies have yielded a reliability model based on the physics of failure. Unsuccessful development of this model originates from the facts that: (i) defects related phenomena responsible for degradation in GaAs-based lasers are difficult to study due to the lack of suitable non-destructive techniques and (ii) degradation process occurs extremely fast after a long period of latency. Therefore, most of laser diode manufacturers perform accelerated multi-cell lifetests to estimate lifetimes of lasers using an empirical model, but this approach is a concern especially for satellite communication systems where high reliability is required of lasers for long-term duration in the space environment. Since it is a challenge to control defects introduced during the growth of laser structures, we studied degradation processes in broad-area InGaAs-AlGaAs strained quantum well (QW) lasers with intrinsic defects as well as those with defects introduced via proton irradiation. For the present study, we investigated the root causes of catastrophic degradation processes in MOCVD-grown broad-area InGaAs-AlGaAs strained QW lasers using various failure mode analysis techniques. A number of lasers were proton irradiated with different energies and fluences. We also studied GaAs double heterostructure (DH) test samples with different amounts of intrinsic defects introduced during MOCVD growth. These samples were proton irradiated as well to introduce additional defects. Deep level transient spectroscopy (DLTS) and time resolved photoluminescence (TR-PL) techniques were employed to study traps (due to point defects) and non-radiative recombination centers (NRCs) in pre- and poststressed lasers, respectively. These characteristics were compared with those in pre- and post-proton irradiated lasers and DHs to study the role that defects and NRCs play in catastrophic degradation processes. Lastly, we employed focused ion beam (FIB), electron beam induced current (EBIC), and high resolution TEM (HR-TEM) techniques to study dark line defects and crystal defects in both post-aged and post-proton irradiated lasers.
III-V multi-junction solar cells are typically based on a triple-junction design that consists of an InGaP top junction, a GaAs middle junction, and a bottom junction that employs a 1 – 1.25 eV material grown on GaAs substrates. The most promising 1 – 1.25 eV material that is currently under extensive investigation is bulk dilute nitride such as (In)GaAsNSb lattice matched to GaAs substrates. The approach utilizing dilute nitrides has a great potential to achieve high performance triple-junction solar cells as recently demonstrated by Wiemer, et al., who achieved a record efficiency of 43.5% from multi-junction solar cells including MBE-grown dilute nitride materials [1]. Although MOVPE is a preferred technique over MBE for III-V multi-junction solar cell manufacturing, MOVPEgrown dilute nitride research is at its infancy compared to MBE-grown dilute nitride. In particular, carrier dynamics studies are indispensible in the optimization of MOVPE materials growth parameters to obtain improved solar cell performance. For the present study, we employed time-resolved photoluminescence (TR-PL) techniques to study carrier dynamics in MOVPE-grown bulk dilute nitride InGaAsN materials (Eg = 1 – 1.25 eV at RT) lattice matched to GaAs substrates. In contrast to our earlier samples that showed high background C doping densities, our current samples grown using different metalorganic precursors at higher growth temperatures showed a significantly reduced background doping density of ~ 1017 /cm3. We studied carrier dynamics in (In)GaAsNSb double heterostructures (DH) with different N compositions at room temperature. Post-growth annealing yielded significant improvements in carrier lifetimes of (In)GaAsNSb double heterostructure (DH) samples. Carrier dynamics at various temperatures between 10 K and RT were also studied from (In)GaAsNSb DH samples including those samples grown on different orientation substrates.
Quantum dot triple junction solar cells (QD TJSCs) have potential for higher efficiency for space and terrestrial
applications. Extended absorption in the QD layers can increase efficiency by increasing the short circuit current density
of the device, as long as carrier extraction remains efficient and quality of the bulk material remains high. Experimental
studies have been conducted to quantify the carrier extraction probability from quantum confined levels and bulk
material. One studies present insight to the carrier extraction mechanisms from the quantum confined states through the
use of temperature dependent measurements. A second study analyses the loss in carrier collection probability in the
bulk material by investigating the change in minority carrier lifetimes and surface recombination velocity throughout the
device. Recent studies for space applications have shown response from quantum structures to have increased radiation
tolerance. The role strain and bonding strength within the quantum structures play in improving the radiation tolerance
is investigated. The combination of sufficiently good bulk material and device enhancement from the quantum
confinement leads to temperature dependent measurements that show TJSCs outperform baseline TJSCs near and above
60°C. Insight into the physical mechanisms behind this phenomenon is presented.
III-V multi-junction solar cells are based on a triple-junction design that consists of an InGaP top junction, a GaAs middle junction, and a bottom junction that employs either a 1eV material grown on the GaAs substrate or InGaAs grown on the Ge substrate. The most promising 1 eV material that is currently under extensive investigation is bulk dilute nitride such as InGaAsN(Sb) lattice matched to GaAs substrates. Both approaches utilizing dilute nitrides and lattice-mismatched InGaAs layers have a potential to achieve high performance triple-junction solar cells. In addition, it will be beneficial for both commercial and space applications if III-V triple-junction solar cells can significantly reduce weight and can be manufactured cost effectively while maintaining high efficiency. The most attractive approach to achieve these goals is to employ full-wafer epitaxial lift off (ELO) technology, which can eliminate the substrate weight and also enable multiple substrate re-usages. For the present study, we employed time-resolved photoluminescence (TR-PL) techniques to study carrier dynamics in MOVPE-grown bulk dilute nitride layers lattice matched to GaAs substrates, where carrier lifetime measurements are crucial in optimizing MOVPE materials growth. We studied carrier dynamics in InGaAsN(Sb) layers with different amounts of N incorporated. Carrier lifetimes were also measured from InGaAsN(Sb) layers at different stages of post-growth thermal annealing steps. Post-growth annealing yielded significant improvements in carrier lifetimes of InGaAsNSb double hetero-structure (DH) samples compared to InGaAsN DH samples possibly due to the surfactant effect of Sb. In addition, we studied carrier dynamics in MOVPE-grown GaAs-InAl(Ga)P layers grown on GaAs substrates. The structures were grown on top of a thin AlAs release layer, which allowed epitaxial layers grown on top of the AlAs layer to be removed from the substrate. The GaAs layers had various doping densities and thicknesses. We present our TR-PL results from both pre- and post-ELO processed GaAs-InAl(Ga)P samples.
High electron mobility transistors (HEMTs) based on AlGaN-GaN hetero-structures are promising for both commercial and military applications that require high voltage, high power, and high efficiency operation. Study of reliability and radiation effects of AlGaN-GaN HEMTs is necessary before solid state power amplifiers based on GaN HEMT technology are successfully deployed in satellite communication systems. Several AlGaN HEMT manufacturers have recently reported encouraging reliability data, but long-term reliability of these devices in the space environment still remains a major concern because a large number of traps and defects are present both in the bulk as well as at the surface leading to undesirable characteristics. This study is to investigate the effects of the AlGaN-GaN HEMTs and AlGaN Schottky diodes irradiated with protons.
Reliability and degradation processes in broad-area InGaAs-AlGaAs strained quantum well (QW) lasers are under
investigation because these lasers are indispensible as pump lasers for fiber lasers and amplifiers that have found an
increasing number of industrial applications in recent years. Extensive efforts by a number of groups to develop
InAs-GaAs quantum dot (QD) lasers have recently led to significant improvement in performance characteristics, but due to a short history of commercialization, high power QD lasers lacks studies in reliability and degradation processes. For the present study, we investigated reliability and degradation processes in MOCVD-grown broad-area
InGaAs-AlGaAs strained QW lasers as well as in MBE-grown broad-area InAs-GaAs QD lasers using various failure mode analysis (FMA) techniques. Dots for the QD lasers were formed via a self-assembly process during MBE growth. We employed two different methods to degrade lasers during accelerated life-testing: commercial lifetester and our newly developed time-resolved electroluminescence (TR-EL) set-up. Our TR-EL set-up allows us to observe formation of a hot spot and subsequent formation and progression of dark spots and dark lines through windowed n-contacts during entire accelerated life-tests. Deep level transient spectroscopy (DLTS) and time resolved photoluminescence (TR-PL) techniques were employed to study trap characteristics and carrier dynamics in pre- and post-stressed QW and QD lasers to identify the root causes of catastrophic degradation processes in these lasers. We also employed electron beam induced current (EBIC), focused ion beam (FIB), and high resolution TEM to study dark line defects and crystal defects in post-aged QW and QD lasers at different stages of degradation.
KEYWORDS: Quantum wells, Reliability, Semiconductor lasers, Lab on a chip, High power lasers, Electroluminescence, Laser applications, Laser optics, Failure analysis, Transmission electron microscopy
Recent remarkable success of fiber lasers and amplifiers results from continued improvements in performance characteristics of broad-area InGaAs-AlGaAs strained quantum well (QW) lasers. Unprecedented characteristics of single emitters include optical output powers of over 20 W and power conversion efficiencies of over 70% under CW operation. Leading high power laser diode manufacturers have recently demonstrated encouraging reliability in these lasers mainly targeted for industrial applications, but long-term reliability of these lasers has never been demonstrated for satellite communication systems in the space environment. Furthermore, as reported by two groups
in 2009, the dominant failure mode of these lasers is catastrophic optical bulk damage (COBD), which is a new failure type that requires physics of failure investigation to understand its root causes.
For the present study, we investigated reliability, proton radiation effects, and the root causes of COBD processes in MOCVD-grown broad-area InGaAs-AlGaAs strained QW lasers using various failure mode analysis (FMA) techniques. Two different approaches, accelerated life-testing and proton irradiation, were taken to generate lasers at different stages of degradation. Our objectives were to (i) study the effects of point defects introduced during crystal growth and those induced by proton irradiation with different energies and fluences in the lasers on degradation processes and to (ii) compare trap characteristics and carrier dynamics in pre- and post-stressed lasers with those in pre- and post-proton irradiated lasers. During entire accelerated life-tests, time resolved electroluminescence (TREL) techniques were employed to observe formation of a hot spot and subsequent formation and progression of dark spots and dark lines through windowed n-contacts.
Bulk InGaAs layers with a 1eV band-gap grown on GaAs substrates are attractive for high efficiency multi-junction
solar cells. However, a large amount of lattice mismatch between bulk InGaAs layer and GaAs substrate
necessitates development of novel metamorphic buffer layers (MBL). A number of research groups have reported
various MBLs for applications including HBTs, HEMTs, lasers, and solar cells. In this study, we report carrier
dynamics and defects in MOVPE-grown bulk InGaAs layers (Eg = ~ 1.0 - 1.1 eV at 300K) with two different types
of MBLs including InGaAs and InGaPSb. We also report the effect of chemical-mechanical polishing (CMP)
process on carrier lifetimes and the properties of the films subsequently grown on top of the MBL. We employed
time-resolved photoluminescence (TR-PL) techniques to study carrier dynamics in InxGa1-xAs samples with and
without the CMP process and a high resolution TEM to study defects in various structures.
Bulk, lattice-matched InGaAsSbN material has been grown by metal organic vapor phase epitaxy (MOVPE) for
applications in concentrated multi-junction solar cells. By optimizing the growth conditions for high Sb and As
partial pressures, we achieved background hole concentrations as low as 2 x 1018 cm-3. After thermal annealing,
the background hole concentration increased from 2x1018 to 2 x 1019 cm-3, although PL intensity increased by a
factor of 7. We recently grew single junction (1eV) solar cells incorporating dilute-nitride materials and devices
were fabricated and characterized for solar cell application. Performance characteristics of these cells without
anti-reflection coating included the efficiency of 4.25% under the AM1.5 (air mass) direct illumination, Voc of
0.7 V, and a spectral response extended to longer wavelength compared with GaAs cells.
Continued improvements in broad-area InGaAs-AlGaAs strained quantum well (QW) lasers have led to
unprecedented performance characteristics in these lasers including optical output powers of over 20 W and power
conversion efficiencies of over 70% under CW operation. Catastrophic optical mirror damage (COMD) is
responsible for failures in (Al)GaAs QW lasers, but InGaAs-AlGaAs strained QW lasers with optimized facet
passivation predominantly fail by catastrophic optical bulk damage (COBD). Since COBD is relatively a new
failure type, it requires physics of failure investigation to understand its root causes and then develop COBD-free
lasers for high reliability applications including potential satellite systems. We recently proposed a model for
degradation mechanism responsible the COBD process and this paper further investigates the root causes of COBD
in the lasers using various failure mode analysis techniques. We investigated reliability and degradation mechanism
in MOCVD-grown broad-area InGaAs-AlGaAs strained QW single emitters. During entire accelerated life-tests of
the lasers we studied, time resolved electroluminescence (TR-EL) techniques were employed to observe formation
of a hot spot and subsequent formation and progression of dark spots and dark lines through windowed n-contacts.
Dilute nitride materials with a 1eV band-gap lattice matched to GaAs substrates are attractive for high-efficiency
multi-junction solar cells. Carrier lifetime measurements are crucial in optimizing material growth and p-i-n field-aided
carrier-extraction-device design. One research group has reported carrier lifetimes of MBE-grown bulk
InGaNAsSb materials, but there has been no report of carrier lifetime measurements from bulk InGaNAsSb grown
by MOVPE. In this study, we report the growth of bulk InGaNAsSb by MOVPE and the first carrier lifetime
measurement from MOVPE-grown bulk InGaNAsSb materials with Eg= 1.0 - 1.2eV at 300K. We studied carrier
dynamics in MOVPE-grown bulk dilute nitride materials nominally lattice matched to GaAs (100) substrates: 1μm
thick In0.035GaN0.025As (Eg= 1.0eV at 300K) and ~0.2μm thick In(0.05-0.07)GaN(0.01-0.02)AsSb(0.02-0.06) layers (Eg= 1.2eV
at 300K). Both structures are fully strained. The incorporation of N in InGaNAs leads to degradation in
photoluminescence efficiency, but prior studies indicate the addition of Sb in MBE-grown InGaNAsSb improved the
PL efficiency. Two-step post-growth thermal annealing processes were optimized to obtain maximum PL
efficiencies that yielded a typical blue shift of 50 and 30meV for InGaNAs and InGaNAsSb, respectively. We
employed a streak camera to measure carrier lifetimes from both as-grown and thermally annealed samples. Carrier
lifetimes of <30psec were obtained from the InGaNAs samples, whereas carrier lifetimes of up to ~150psec were
obtained from the InGaNAsSb samples. We discuss possible reasons for short carrier lifetimes measured from
MOVPE-grown InGaNAs(Sb) materials.
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