Mr. Yasuhiko Sato Profile

Yasuhiko Sato

at Toshiba Corp

SPIE Involvement:

Author

Publications (4)

SPIE Journal Paper | 1 April 2006

Application of polysilazane to etch mask in pattern transfer processes for deep and vacuum ultraviolet lithography

Yasuhiko Sato, Junko Abe

JM3, Vol. 5, Issue 02, 023007, (April 2006) https://doi.org/10.1117/12.10.1117/1.2198841

KEYWORDS: Etching, Silicon, Resistance, Reflectivity, Chemical vapor deposition, Photomasks, Lithography, X-rays, Glasses, Reactive ion etching

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Proceedings Article | 14 May 2004 Paper

Application of polysilazane to etch mask in pattern transfer processes for deep and vacuum UV lithography

Yasuhiko Sato, Junko Abe, Tsuyoshi Shibata

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.533365

KEYWORDS: Etching, Silicon, Resistance, Reflectivity, Lithography, Photomasks, Carbon, Refractive index, Photoresist processing, Chemical vapor deposition

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Proceedings Article | 24 July 2002 Paper

Material and process development of tri-level resist system in KrF and ArF lithography

Tsuyoshi Shibata, Seiji Nakagawa, Yasuhiko Sato, Koutaro Sho, Hisataka Hayashi, Junko Abe

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474278

KEYWORDS: Lithography, Reflectivity, Reactive ion etching, Photoresist processing, Etching, Deep ultraviolet, Carbon, Scanning electron microscopy, Photoresist materials, Imaging systems

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Proceedings Article | 11 June 1999 Paper

Application of polysilanes for deep-UV antireflective coating

Yasunobu Onishi, Yasuhiko Sato, Eishi Shiobara, Seiro Miyoshi, Hideto Matsuyama, Junko Abe, Hideo Ichinose, Tokuhisa Ohiwa, Yoshihiko Nakano, Sawako Yoshikawa, Shuzi Hayase

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350203

KEYWORDS: Etching, Deep ultraviolet, Dielectrics, Coating, Interfaces, Refractive index, Antireflective coatings, Photoresist materials, Reflectivity, Reflection

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