Prof. Young-Sik Kim Profile

Prof. Young-Sik Kim

at Wyant College of Optical Sciences

SPIE Involvement:

Author

Publications (34)

SPIE Journal Paper | 20 December 2024

Fourteen-meter aperture deployable off-axis far-infrared space telescope design for SALTUS observatory

Daewook Kim, Youngsik Kim, Heejoo Choi, Marcos Esparza, Oliver Wu, Tianyao Zhang, Yuzuru Takashima, Arthur Palisoc, Christopher Walker

JATIS, Vol. 10, Issue 04, 042309, (December 2024) https://doi.org/10.1117/12.10.1117/1.JATIS.10.4.042309

KEYWORDS: Mirror surfaces, Wavefront errors, Design, Optical surfaces, Mirrors, Space telescopes, Optical design, Tolerancing, Observatories, Equipment

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Proceedings Article | 6 October 2023 Presentation

Presentation

Theory and practice of high-harmonic diffractive surfaces

Thomas Milster, Young-Sik Kim, Nick Brar, Zichan Wang

Proceedings Volume PC12684, PC1268408 (2023) https://doi.org/10.1117/12.2682625

KEYWORDS: Lenses, Design and modelling, Refractive index, Optical properties, Optical path differences, Optical gratings, Glass molding, Fabrication, Diffraction gratings, Diffraction

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Proceedings Article | 5 October 2023 Presentation

Presentation

Ultralightweight hybrid refractive/diffractive MODE telescopes for space applications

Thomas Milster, Nick Brar, Yingying Zhang, Young-Sik Kim, Heejoo Choi, Marcos Esparza, Daewook Kim, Allen Yi, Yuxin Cai, Geonhee Kim, Daniel Apai

Proceedings Volume PC12677, PC126770G (2023) https://doi.org/10.1117/12.2677762

KEYWORDS: Telescopes, Optical alignment, Space telescopes, Optical fabrication, Lenses, Fabrication, Wavefronts, Stray light, Spectroscopy, Space mirrors

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Proceedings Article | 4 October 2023 Presentation + Paper

Presentation + Paper

Approaches to developing tolerance and error budget for active three mirror anastigmat space telescopes

Heejoo Choi, Young-Sik Kim, Hyukmo Kang, Solvay Blomquist, Hill Tailor, Douglas Kelly, Mike Eiklenborg, Ewan Douglas, Daewook Kim

Proceedings Volume 12677, 126770F (2023) https://doi.org/10.1117/12.2677986

KEYWORDS: Tolerancing, Received signal strength, Telescopes, Mirrors, Wavefront errors, Observatories, Space mirrors, Space telescopes, Optical surfaces, Optical design

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Proceedings Article | 3 October 2022 Presentation + Paper

Presentation + Paper

Initial testing of a MODE lens telescope

Youngsik Kim, Marcos Esparza, Zichan Wang, Nicholas Brar, Yingying Zhang, Daewook Kim, Heejoo Choi, Daniel Apai, Chuck Fellows, Allen Yi, Yuxin Cai, Geonhee Kim, Hwanjin Choi, Woojong Yeo, Tom Milster

Proceedings Volume 12221, 122210J (2022) https://doi.org/10.1117/12.2633443

KEYWORDS: Telescopes, Diffraction, Lens design, Spherical lenses, Optical instrument design, Optical fabrication, Glasses

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Proceedings Article | 3 October 2022 Presentation + Paper

Presentation + Paper

Nautilus Space Observatory: a very large aperture space telescope constellation enabled by scalable optical manufacturing technologies

Dániel Apai, Tom Milster, Daewook Kim, Youngsik Kim, Glenn Schneider, Benjamin Rackham, Jonathan Arenberg, Heejoo Choi, Marcos Esparza, Zichan Wang, Yingying Zhang, Alex Bixel

Proceedings Volume 12221, 122210C (2022) https://doi.org/10.1117/12.2633184

KEYWORDS: Diffractive optical elements, Astrobiology, Telescopes, Space observatories, Planets, Space telescopes, James Webb Space Telescope, Space operations, Stars, Satellites, Optical fabrication

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Proceedings Article | 3 October 2022 Presentation + Paper

Presentation + Paper

Stray light analysis and testing of a MODE lens telescope

Youngsik Kim, Marcos Esparza, Zichan Wang, Nicholas Brar, Heejoo Choi, Daewook Kim, Daniel Apai, Tom Milster

Proceedings Volume 12221, 122210F (2022) https://doi.org/10.1117/12.2635495

KEYWORDS: Stray light, Telescopes, Stray light analysis, Ray tracing, Lens design, Cameras, Receivers, Optical testing, Optical fabrication

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Proceedings Article | 3 October 2022 Presentation + Paper

Presentation + Paper

Precision glass molding technology for the MODE lens telescope

Nick Brar, Yingying Zhang, Youngsik Kim, Allen Yi, Yuxin Cai, Geon Hee Kim, Thomas Milster

Proceedings Volume 12221, 122210G (2022) https://doi.org/10.1117/12.2633573

KEYWORDS: Glasses, Glass molding, Precision glass molding, Diffraction gratings, Telescopes, Surface roughness, Diamond turning, Aspheric lenses, Lens design

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Proceedings Article | 3 October 2022 Presentation + Paper

Presentation + Paper

Type 2 longitudinal chromatic aberration from a high-harmonic MODE lens and color corrector

Thomas Milster, Youngsik Kim, Zichan Wang

Proceedings Volume 12221, 122210D (2022) https://doi.org/10.1117/12.2633425

KEYWORDS: Telescopes, Imaging systems, Image processing, Chromatic aberrations, Lens design, Diffraction, Optical instrument design

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Proceedings Article | 3 October 2022 Presentation + Paper

Presentation + Paper

Fabrication, assembly, and testing of a MODE lens color corrector

Zichan Wang, Youngsik Kim, Allen Yi, Hwanjin Choi, Geonhee Kim, Tom Milster

Proceedings Volume 12221, 122210E (2022) https://doi.org/10.1117/12.2633517

KEYWORDS: Tolerancing, Lens design, Optical fabrication, Optical components, Optomechanical design, Prototyping, Optical alignment, Diffractive optical elements, Diffraction, Glasses

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Proceedings Article | 27 August 2022 Poster + Paper

Poster + Paper

Tolerance analysis of a self-coherent camera for wavefront sensing and dark hole maintenance

Kevin Derby, Sebastiaan Haffert, Jaren Ashcraft, Kian Milani, Heejoo Choi, Young-Sik Kim, Laird Close, Christopher Mendillo, Supriya Chakrabarti, Gregory Allan, Leonid Pogorelyuk, Kerri Cahoy, Mamadou N'Diaye, Daewook Kim, Jared Males, Ewan Douglas

Proceedings Volume 12180, 1218069 (2022) https://doi.org/10.1117/12.2629578

KEYWORDS: Wavefronts, Sensors, Coronagraphy, Wavefront sensors, Tolerancing, Cameras, Stars, Telescopes, Photodetectors, Error analysis

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Proceedings Article | 19 November 2021 Presentation + Paper

Presentation + Paper

Theory of color correction in high-harmonic diffractive lenses

Tom Milster, Zichan Wang, Youngsik Kim

Proceedings Volume 12078, 120780Y (2021) https://doi.org/10.1117/12.2603643

KEYWORDS: Lenses, Glasses, Diffraction, Imaging systems, Chromatic aberrations, Refractive index, Polymethylmethacrylate, Fresnel lenses, Lens design, Image quality

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Proceedings Article | 5 March 2021 Presentation + Paper

Presentation + Paper

Progress toward a VUV Raman spectrometer to detect pathogens

Sanja Dmitrovic, Brian Molnar, Young Sik Kim, David Schumann, James Foley, Jacob Shelley, Tom Milster

Proceedings Volume 11655, 116551G (2021) https://doi.org/10.1117/12.2583347

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Proceedings Article | 12 September 2019 Presentation

Presentation

High-speed LiDAR by multi-order laser beam steering with digital micromirror device (Conference Presentation)

Joshua Rodriguez, Braden Smith, Brandon Hellman, Heejoo Choi, Guanghao Chen, Young Sik Kim, Dae Wook Kim, Yuzuru Takashima

Proceedings Volume 11125, 111250I (2019) https://doi.org/10.1117/12.2529029

KEYWORDS: LIDAR, Digital micromirror devices, Beam steering, Laser sources, Semiconductor lasers, Laser applications, Optical components, Microscopy, Microelectromechanical systems, Mirrors

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Proceedings Article | 30 August 2019 Presentation + Paper

Presentation + Paper

Adaptive optics correction using coherently illuminated diffractive objects

Emily Finan, Tom Milster, Youngsik Kim

Proceedings Volume 11125, 1112509 (2019) https://doi.org/10.1117/12.2530045

KEYWORDS: Adaptive optics, Data storage, Monochromatic aberrations, Wavefront sensors, Deformable mirrors, Optical storage

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Proceedings Article | 14 September 2018 Presentation + Paper

Presentation + Paper

Single detector imaging lidar by digital micromirror device for large field-of-view and mid-range mapping applications

Brandon Hellman, Adley Gin, Braden Smith, Young-Sik Kim, Guanghao Chen, Paul Winkler, Phillip McCann, Yuzuru Takashima

Proceedings Volume 10757, 107570H (2018) https://doi.org/10.1117/12.2323878

KEYWORDS: LIDAR, Digital micromirror devices, Spatial resolution, Receivers, Distance measurement, Transmitters, Ranging, Imaging systems, Microelectromechanical systems

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SPIE Journal Paper | 9 March 2018

Optical design and system characterization of an imaging microscope at 121.6 nm

Weichuan Gao, Emily Finan, Geon-Hee Kim, Youngsik Kim, Thomas D. Milster

OE, Vol. 57, Issue 03, 035101, (March 2018) https://doi.org/10.1117/12.10.1117/1.OE.57.3.035101

KEYWORDS: Mirrors, Imaging systems, Microscopes, Optical design, Wavefronts, Objectives, Tolerancing, Optical alignment, Vacuum ultraviolet, Reflectivity

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SPIE Journal Paper | 31 October 2017

Characterization of emission from aggregated gold nanoparticles excited nonlinearly by 1560-nm femtosecond laser

Akira Eguchi, Phat Lu, Youngsik Kim, Tom Milster

JNP, Vol. 11, Issue 04, 046007, (October 2017) https://doi.org/10.1117/12.10.1117/1.JNP.11.046007

KEYWORDS: Polarization, Gold, Scanning electron microscopy, Nanoparticles, Femtosecond phenomena, Short wave infrared radiation, Microscopes, Visible radiation, Atmospheric particles, Solids

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Proceedings Article | 20 September 2017 Presentation

Presentation

Adaptive optics for data recovery on optical disk fragments (Conference Presentation)

Thomas Milster, Young Sik Kim

Proceedings Volume 10384, 103840J (2017) https://doi.org/10.1117/12.2277078

KEYWORDS: Adaptive optics, Solids, Optical design, Microscopes, Digital video discs, Optical discs, Imaging systems, Wavefront sensors, Deformable mirrors, Objectives

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Proceedings Article | 17 September 2016 Paper

Paper

Characterization of multiphoton emission from aggregated gold nano particles

Akira Eguchi, Phat Lu, Youngsik Kim, Tom Milster

Proceedings Volume 9921, 99210X (2016) https://doi.org/10.1117/12.2235937

KEYWORDS: Gold, Atmospheric particles, Scanning electron microscopy, Silicon, Microscopes, Nanoparticles, Binary data, Luminescence, Femtosecond phenomena, Near infrared

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Proceedings Article | 27 August 2015 Paper

Paper

Optomechanical design and tolerance of a microscope objective at 121.6 nm

Derek Keyes, Thiago Jota, Weichuan Gao, Dakota Luepke, Victor Densmore, Young-Sik Kim, Gun-Hee Kim, Thomas Milster

Proceedings Volume 9575, 957506 (2015) https://doi.org/10.1117/12.2188803

KEYWORDS: Mirrors, Objectives, Microscopes, Tolerancing, Optomechanical design, Diffraction, Laser induced fluorescence, Optical components, Microscopy, Control systems

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Proceedings Article | 5 September 2014 Paper

Paper

A high-NA solid immersion objective for imaging a Blue-ray disc and investigating subsurface damage

Victor Densmore, Young Sik Kim, Tom Milster, Matt Watson, Dolaphine Kwok

Proceedings Volume 9201, 92010Q (2014) https://doi.org/10.1117/12.2062255

KEYWORDS: Objectives, Solids, Optical storage, Aspheric lenses, Tolerancing, Microscopes, Light emitting diodes, Dielectrics, Zemax, Plano

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Proceedings Article | 15 October 2013 Paper

Paper

Fabrication of solid immersion lens applied to infrared microscopy to improve the spatial resolution over its diffraction limit

Hayeong Sung, Myung Sang Huh, Gil Jae Lee, Kyesung Lee, Youngsik Kim, Geunman Ryu, Sun Choel Yang, Ki-Ju Yee, Chan pil Park, Geonhee Kim

Proceedings Volume 8884, 88842B (2013) https://doi.org/10.1117/12.2029162

KEYWORDS: Objectives, Spatial resolution, Infrared imaging, Thermography, Tolerancing, Germanium, Refractive index, Imaging systems, Infrared cameras, Solids

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Proceedings Article | 26 September 2013 Paper

Paper

Exoplanet detection and characterization using combined coronagraphy and sub-UAS astrometry from space

Eduardo Bendek, Olivier Guyon, Ruslan Belikov, S. Mark Ammons, Thomas Milster, Young-Sik Kim, Lee Johnson

Proceedings Volume 8864, 886405 (2013) https://doi.org/10.1117/12.2024316

KEYWORDS: Stars, Coronagraphy, Distortion, Mirrors, Calibration, Imaging systems, Space telescopes, Exoplanets, Exoplanetary science, Cameras

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SPIE Journal Paper | 23 February 2012

Characterization of photoresist and simulation of a developed resist profile for the fabrication of gray-scale diffractive optic elements

Jong Rak Park, Justin Sierchio, Melissa Zaverton, Youngsik Kim, Thomas Milster

OE, Vol. 51, Issue 02, 023401, (February 2012) https://doi.org/10.1117/12.10.1117/1.OE.51.2.023401

KEYWORDS: Photoresist materials, Photoresist developing, Optical components, Absorption, Bragg cells, Device simulation, Photoresist processing, Image processing, Lithography, Optical engineering

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Proceedings Article | 16 September 2003 Paper

Paper

Ultrasmall optical pickup module

Sang-Cheon Kim, YoungSik Kim, See-Hyung Lee, Man-Hyung Lee, Jin-Yong Kim

Proceedings Volume 5069, (2003) https://doi.org/10.1117/12.533123

KEYWORDS: Glasses, Signal detection, Head, Objectives, Semiconductor lasers, Silicon, Optical components, Binary data, Integrated optics, Semiconducting wafers

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Proceedings Article | 5 July 2000 Paper

Paper

Optimization for full-chip process of 130-nm technology with 248-nm DUV lithography

Young-Mog Ham, Seok-Kyun Kim, Sang-Jin Kim, Cheol Hur, YoungSik Kim, Ki-Ho Baik, Bong-Ho Kim, Dong-Jun Ahn

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388941

KEYWORDS: Photomasks, Optical proximity correction, Lithography, Critical dimension metrology, Semiconducting wafers, Optical lithography, Electroluminescence, Deep ultraviolet, Structural design, Scanners

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Proceedings Article | 5 July 2000 Paper

Paper

Comparison study for sub-0.13-um lithography between ArF and KrF lithography

Seok-Kyun Kim, YoungSik Kim, Jin-Soo Kim, Cheol-Kyu Bok, Young-Mog Ham, Ki-Ho Baik

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389031

KEYWORDS: Lithography, Photoresist processing, Electroluminescence, Printing, Photomasks, Critical dimension metrology, Etching, Data modeling, Lithographic illumination, Resistance

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Proceedings Article | 25 June 1999 Paper

Paper

Optimization of alignment key in electron-beam lithography

Cheol-Kyun Kim, Cheol Hur, YoungSik Kim, Ki-Ho Baik

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351125

KEYWORDS: Optical alignment, Overlay metrology, Silicon, Electron beam lithography, Lithography, Beam shaping, Oxides, Electron beams, CMOS devices, Aluminum

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Proceedings Article | 26 May 1995 Paper

Paper

Study of optical proximity effects using off-axis illumination with attenuated phase shift mask

Chang-Nam Ahn, Ki-Ho Baik, Yong-Suk Lee, Hung-Eil Kim, Ikboum Hur, YoungSik Kim, Ju-Hwan Kim, Soo-Han Choi

Proceedings Volume 2440, (1995) https://doi.org/10.1117/12.209254

KEYWORDS: Transmittance, Photomasks, Phase shifts, Lithography, Super resolution, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Scanning electron microscopy, Optical lithography

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Proceedings Article | 17 May 1994 Paper

Paper

Fundamental analysis on fabrication of 256-MB DRAM using phase-shift mask technology

Young-Mog Ham, YoungSik Kim, Ikboum Hur, Ki-Yeop Park, Hung-Eil Kim, Dong-Jun Ahn, Soo-Han Choi

Proceedings Volume 2197, (1994) https://doi.org/10.1117/12.175419

KEYWORDS: Photomasks, Photoresist processing, Phase shifts, Transmittance, Image processing, Semiconducting wafers, Lithography, Process control, Metals, Phase shifting

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Proceedings Article | 17 May 1994 Paper

Paper

Quarter-micrometer i-line lithography using an alternating phase-shift mask

Hung-Eil Kim, YoungSik Kim, Chul-Seung Lee, Young-Mog Ham, Dong-Jun Ahn, Soo-Han Choi

Proceedings Volume 2197, (1994) https://doi.org/10.1117/12.175457

KEYWORDS: Photomasks, Phase shifts, Lithography, Transmittance, Critical dimension metrology, Optical lithography, Lithographic illumination, Phase shifting, Reticles, Photoresist materials

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Proceedings Article | 1 May 1994 Paper

Paper

Process-induced effects on the intrafield overlay error

Young-Mog Ham, Chul-Seung Lee, YoungSik Kim, Dong-Jun Ahn, Soo-Han Choi, YeonSeon Seo, Mark Merrill

Proceedings Volume 2196, (1994) https://doi.org/10.1117/12.174138

KEYWORDS: Overlay metrology, Deposition processes, Etching, Optical alignment, Molybdenum, Integrated circuits, Error analysis, Lithography, Semiconducting wafers, Oxidation

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Proceedings Article | 1 June 1992 Paper

Paper

Trend and limitation of process using the simulation and experimental method for phase-shift mask

Young-Mog Ham, YoungSik Kim, H. Oh, Dong-Jun Ahn, K. Oh

Proceedings Volume 1674, (1992) https://doi.org/10.1117/12.130342

KEYWORDS: Image processing, Photomasks, Phase shifts, Optical lithography, Lithium, Process control, Image analysis, Scanning electron microscopy, Lithography, Computer simulations

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Showing 5 of 34 publications

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