Dr. Youxian Wen Profile

Dr. Youxian Wen

Director of WW Application/Senior Technologist at Tokyo Electron America Inc

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Author

Publications (12)

Proceedings Article | 24 March 2009 Paper

Process optimization for optical CD correlation improvement of ADI and AEI 3D structure by using iODP

Anice Lee, Chung-Yi Lin, F. Y. Chen, Wen-Hao Chang, Sean Hsu, Allen Li, Ying Luo, Youxian Wen

Proceedings Volume 7272, 727244 (2009) https://doi.org/10.1117/12.814023

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Photoresist processing, Process control, Finite element methods, Etching, Wafer-level optics, Metrology, Silicon, Reflectometry

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Proceedings Article | 1 December 2008 Paper

Optimizing integrated optical CD monitoring by floating pre-process variations in a complex multi-layer structure

Marlene Strobl, Lisa Huang, Allen Li, Ying Luo, Youxian Wen

Proceedings Volume 7140, 71400G (2008) https://doi.org/10.1117/12.804636

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Scatterometry, Metrology, Mathematical modeling, Data modeling, Thin films, Integrated optics, Process control, Optical properties

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Proceedings Article | 25 March 2008 Paper

Development of back-end-of-the-line applications using optical digital profilometry (ODP)

Jun-Ji Huang, J. H. Yeh, Ying Luo, Li Wu, Youxian Wen

Proceedings Volume 6922, 69223K (2008) https://doi.org/10.1117/12.769257

KEYWORDS: Transmission electron microscopy, Copper, Etching, Reflectometry, Metrology, Chemical mechanical planarization, Critical dimension metrology, Back end of line, Photomasks, Metals

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Proceedings Article | 19 August 2005 Paper

Improvement in total measurement uncertainty for gate CD control

Benjamin Bunday, Osman Sorkhabi, Youxian Wen, Ajit Paranjpe, Paul Terbeek, John Allgair, Amy Peterson

Proceedings Volume 5878, 58780M (2005) https://doi.org/10.1117/12.616344

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Amorphous silicon, Finite element methods, Metrology, Scatterometry, Data modeling, Oxides, Calibration, Reticles

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Proceedings Article | 10 May 2005 Paper

Application of scatterometry for evaluation of lithographic process and OPC model generation

Karen Huang, Joungchel Lee, Youxian Wen, Jon Opsal

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.600183

KEYWORDS: Scatterometry, Optical proximity correction, Scanning electron microscopy, Data modeling, Scatter measurement, Semiconducting wafers, Process modeling, Lithography, Calibration, Time metrology

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Proceedings Article | 10 May 2005 Paper

Performance of measuring contact holes using the Opti-Probe 7341 3-D RT/CD technology

Osman Sorkhabi, Heath Pois, Hanyou Chu, Youxian Wen, Jon Opsal, Won Kim

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.598955

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Process control, Metrology, Inspection, Data modeling, Reflectometry, Spectroscopy, Optical lithography, Lithography

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Proceedings Article | 27 January 2005 Paper

CD variation control based on accurate characterization of 193-nm material and CD metrology

Youxian Wen, Heath Pois, Jon Opsal

Proceedings Volume 5645, (2005) https://doi.org/10.1117/12.577276

KEYWORDS: Critical dimension metrology, Dispersion, Process control, Optical properties, Standards development, Data modeling, Metrology, Very large scale integration, Lithography, Thin films

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Proceedings Article | 24 May 2004 Paper

Contact hole application for lithography process development using the Opti-Probe three-dimensional RT/CD technology

Zhiming Jiang, Osman Sorkhabi, Hanyou Chu, XueLong Cao, Guangwei Li, Youxian Wen, Jon Opsal, Yia-Chung Chang

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.556587

KEYWORDS: Semiconducting wafers, Photoresist materials, Lithography, Finite element methods, Inspection, Oxides, Process control, 3D metrology, Metrology, Critical dimension metrology

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Proceedings Article | 2 June 2003 Paper

Real-time optical CD metrology for litho process

Jon Opsal, Youxian Wen, Joungchel Lee, Walter Smith

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.487605

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Photoresist materials, Metrology, Reticles, Finite element methods, Wafer-level optics, Inspection, Etching, Cadmium

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Proceedings Article | 2 June 2003 Paper

Contact hole inspection by real-time optical CD metrology

Jon Opsal, Hanyou Chu, Youxian Wen, Guangwei Li, Yia-Chung Chang

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.487607

KEYWORDS: Inspection, Critical dimension metrology, Semiconducting wafers, Optical inspection, Diffraction, Scattering, Microelectronics, Oxides, Spectroscopy, Silicon

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Proceedings Article | 16 July 2002 Paper

Fundamental solutions for real-time optical CD metrology

Jon Opsal, Hanyou Chu, Youxian Wen, Yia-Chung Chang, Guangwei Li

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473448

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Inspection, Etching, Microelectronics, Dielectrics, Cadmium, Oxides, Finite element methods, Optical lithography

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Proceedings Article | 22 September 1993 Paper

Control system for detecting cut-time of milk coagulation using ultrasonic method

Youxian Wen, Jianyin Liu, Liming Yu, Sundaram Gunasekaran

Proceedings Volume 2101, (1993) https://doi.org/10.1117/12.156365

KEYWORDS: Ultrasonics, Control systems, Transducers, Control systems design, Signal processing, Calcium, Receivers, Signal attenuation, Time metrology, Agriculture

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Showing 5 of 12 publications

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