Dr. Yuichi Yoshida Profile

Dr. Yuichi Yoshida

at Tokyo Electron Kyushu Ltd

SPIE Involvement:

Author

Publications (11)

Proceedings Article | 8 April 2019 Paper

PSCAR optimization to reduce EUV resist roughness with sensitization using Resist Formulation Optimizer (RFO)

Seiji Nagahara, Cong Que Dinh, Gosuke Shiraishi, Yuya Kamei, Kathleen Nafus, Yoshihiro Kondo, Michael Carcasi, Yukie Minekawa, Hiroyuki Ide, Yuichi Yoshida, Kosuke Yoshihara, Ryo Shimada, Masaru Tomono, Kazuhiro Takeshita, Serge Biesemans, Hideo Nakashima, Danilo De Simone, John Petersen, Philippe Foubert, Peter De Bisschop, Geert Vandenberghe, Hans-Jürgen Stock, Balint Meliorisz

Proceedings Volume 10960, 109600A (2019) https://doi.org/10.1117/12.2515187

KEYWORDS: Stochastic processes, Calibration, Extreme ultraviolet, Line edge roughness, 3D modeling, Extreme ultraviolet lithography, Switching

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Proceedings Article | 26 March 2019 Paper

Calibrated PSCAR stochastic simulation

Cong Que Dinh, Seiji Nagahara, Gousuke Shiraishi, Yukie Minekawa, Yuya Kamei, Michael Carcasi, Hiroyuki Ide, Yoshihiro Kondo, Yuichi Yoshida, Kosuke Yoshihara, Ryo Shimada, Masaru Tomono, Teruhiko Moriya, Kazuhiro Takeshita, Kathleen Nafus, Serge Biesemans, John Petersen, Danilo De Simone, Philippe Foubert, Peter De Bisschop, Geert Vandenberghe, Hans-Jürgen Stock, Balint Meliorisz

Proceedings Volume 10957, 109571O (2019) https://doi.org/10.1117/12.2515183

KEYWORDS: Modeling and simulation, Calibration, Ultraviolet radiation, Extreme ultraviolet lithography, Stochastic processes, Data modeling, Line width roughness, Extreme ultraviolet, Scanning electron microscopy

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Proceedings Article | 20 March 2012 Paper

Resist process optimization for further defect reduction

Keiichi Tanaka, Tomohiro Iseki, Hiroshi Marumoto, Koji Takayanagi, Yuichi Yoshida, Ryouichi Uemura, Kosuke Yoshihara

Proceedings Volume 8325, 83252L (2012) https://doi.org/10.1117/12.915813

KEYWORDS: Semiconducting wafers, Particles, Photoresist processing, Bridges, Wafer manufacturing, Polymers, Capillaries, Yield improvement, NOx, Optical lithography

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Proceedings Article | 1 April 2009 Paper

Study of residue type defect formation mechanism and the effect of advanced defect reduction (ADR) rinse process

Hiroshi Arima, Yuichi Yoshida, Kosuke Yoshihara, Tsuyoshi Shibata, Yuki Kushida, Hiroki Nakagawa, Yukio Nishimura, Yoshikazu Yamaguchi

Proceedings Volume 7273, 727333 (2009) https://doi.org/10.1117/12.814034

KEYWORDS: Polymers, Photoresist processing, Image processing, Materials processing, Semiconducting wafers, Photoresist developing, Lithography, Photomasks, Dynamic light scattering, Photoresist materials

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Proceedings Article | 1 April 2009 Paper

Non-topcoat process development for ArF immersion lithography

Takehiko Naruoka, Nobuji Matsumura, Akimasa Soyano, Shiro Kusumoto, Yoshikazu Yamaguchi, Hiroshi Arima, Yuichi Yoshida, Kousuke Yoshihara, Tsuyoshi Shibata

Proceedings Volume 7273, 727328 (2009) https://doi.org/10.1117/12.814084

KEYWORDS: Surface properties, Water, Immersion lithography, Lithography, Photoresist processing, Thin film coatings, Semiconducting wafers, Defect inspection, Coating, Line width roughness

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Proceedings Article | 20 October 2006 Paper

NIL template making and imprint evaluation

Yuuichi Yoshida, Ayumi Kobiki, Takaaki Hiraka, Satoshi Yusa, Shiho Sasaki, Kimio Itoh, Nobuhito Toyama, Masaaki Kurihara, Hiroshi Mohri, Naoya Hayashi

Proceedings Volume 6349, 63492C (2006) https://doi.org/10.1117/12.692886

KEYWORDS: Photomasks, Quartz, Nanoimprint lithography, Manufacturing, Semiconducting wafers, Inspection, Etching, Photoresist processing, Vestigial sideband modulation, Electron beams

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Proceedings Article | 20 May 2006 Paper

Dry etch technology development for NIL template

Yuuichi Yoshida, Tsuyoshi Amano, Shiho Sasaki, Kimio Itoh, Nobuhito Toyama, Hiroshi Mohri, Naoya Hayashi

Proceedings Volume 6283, 62833G (2006) https://doi.org/10.1117/12.681835

KEYWORDS: Quartz, Etching, Line edge roughness, Photomasks, Vestigial sideband modulation, Nanoimprint lithography, Lithography, Photoresist processing, Beam shaping, Scanning electron microscopy

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Proceedings Article | 20 May 2006 Paper

In-field CD uniformity control by altering transmission distribution of the photomask using ultra-fast pulsed laser technology

Yasutaka Morikawa, Takanori Sutou, Yuichi Inazuki, Takashi Adachi, Yuuichi Yoshida, Kouichirou Kojima, Shiho Sasaki, Hiroshi Mohri, Naoya Hayashi, Vladimir Dmitriev, Sergey Oshemkov, Eitan Zait, Guy Ben-Zvi

Proceedings Volume 6283, 62831Y (2006) https://doi.org/10.1117/12.681762

KEYWORDS: Semiconducting wafers, Photomasks, Signal attenuation, Critical dimension metrology, Binary data, Ultrafast phenomena, Laser applications, Laser scattering, Quartz, Scattering

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Proceedings Article | 6 December 2004 Paper

Defect inspection and repair performance on CPL masks for 90- and 65-nm node line patterns

Yasutaka Morikawa, Kouichirou Kojima, Hiroyuki Hashimoto, Yuuichi Yoshida, Shiho Sasaki, Hiroshi Mohri, Naoya Hayashi

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569186

KEYWORDS: Inspection, Photomasks, Defect detection, Printing, Quartz, Resolution enhancement technologies, Defect inspection, Neodymium, Lithography, Manufacturing

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Proceedings Article | 20 August 2004 Paper

Mask CD measurements with an atomic force microscope

Yuuichi Yoshida, Shiho Sasaki, Tsukasa Abe, Hiroshi Mohri, Naoya Hayashi

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557765

KEYWORDS: Photomasks, Atomic force microscopy, Scanning electron microscopy, Critical dimension metrology, Semiconducting wafers, 3D metrology, Atomic force microscope, Metrology, Printing, Wafer-level optics

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Proceedings Article | 28 August 2003 Paper

PSM quartz etch depth evaluation with an atomic force microscope

Kenji Noguchi, Shiho Sasaki, Yuuichi Yoshida, Takashi Adachi, Tsukasa Abe, Hiroshi Mohri, Haruo Kokubo, Yasutaka Morikawa, Naoya Hayashi

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504065

KEYWORDS: Etching, Photomasks, Dry etching, Atomic force microscopy, Phase shifts, Atomic force microscope, Printing, Quartz, Semiconducting wafers, Chromium

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Showing 5 of 11 publications

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