In this paper, based on numerical study using the finite difference time domain method, we designed metal slits for
higher harmonic fringe patterns generated with surface plasmon interference lithography. The slits were designed to
generate higher fringe patterns having high intensity output, high contrast and good uniformity in sub-100nm scale.
After fabricating several types of slits on aluminum film mask according to the calculated designs with a focused ion
beam facility, lithography experiments using the aluminum slits were performed to record the near-filed fringe patterns
using i-line Hg lamp and SU-8 negative photoresist.
Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks.
You are receiving this notice because your organization may not have SPIE eBooks access.*
*Shibboleth/Open Athens users─please
sign in
to access your institution's subscriptions.
To obtain this item, you may purchase the complete book in print or electronic format on
SPIE.org.
INSTITUTIONAL Select your institution to access the SPIE Digital Library.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.