Dr. Yuri Paskover Profile

Dr. Yuri Paskover

R&D Scientist at KLA Israel

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 26 May 2022 Poster + Paper

Spectral analysis overlay measurement approach for improvement of overlay accuracy in advanced integrated circuits

Vladimir Levinski, Yuri Paskover, Sharon Aharon, Daria Negri, Nadav Gutman, K. Nireekshan Reddy, Jeongpyo Lee, Hedvi Spielberg, Dongyoung Lee, Hyunjun Kim, Sukwon Park, Bohye Kim, Hongseok Jang, Honggoo Lee, Sangho Lee

Proceedings Volume 12053, 120531Z (2022) https://doi.org/10.1117/12.2613981

KEYWORDS: Semiconducting wafers, Overlay metrology, Process control, Integrated circuits, Wafer-level optics, Scanners, Principal component analysis, Manufacturing, Inspection, Accuracy assessment

Read Abstract +

Proceedings Article | 20 March 2020 Presentation + Paper

Optical imaging metrology calibration using high voltage scanning electron microscope at after-development inspection for advanced processes

N. Gutman, I. Tarshish, R. Gronheid, C. Dror, D. Michelsson, H. Backhauss, L. Levin, V. Levinski, Y. Paskover, L. Yerushalmi, T. Heidrich, S. Czerkas, U. Pohlmann, F. Laske

Proceedings Volume 11325, 113251X (2020) https://doi.org/10.1117/12.2551797

KEYWORDS: Scanning electron microscopy, Overlay metrology, Metrology, Calibration, Optical calibration

Read Abstract +

Proceedings Article | 20 March 2020 Presentation + Paper

On product overlay metrology challenges in advanced nodes

Andrei Shchegrov, Philippe Leray, Yuri Paskover, Liran Yerushalmi, Efi Megged, Yoav Grauer, Roel Gronheid

Proceedings Volume 11325, 113251P (2020) https://doi.org/10.1117/12.2551932

KEYWORDS: Optical parametric oscillators, Metrology, Overlay metrology, Logic, Optical alignment, Semiconducting wafers, 3D metrology, Polarization, Extreme ultraviolet, Etching

Read Abstract +

Proceedings Article | 30 March 2017 Paper

Process resilient overlay target designs for advanced memory manufacture

Joonseuk Lee, Mirim Jung, Honggoo Lee, Youngsik Kim, Sangjun Han, Michael Adel, Tal Itzkovich, Vladimir Levinski, Victoria Naipak, Anna Golotsvan, Amnon Manassen, Yuri Paskover, Tom Leviant, Efi Megged, Myungjun Lee, Mark Smith, Do-Hwa Lee, DongSub Choi, Zephyr Liu

Proceedings Volume 10145, 1014524 (2017) https://doi.org/10.1117/12.2258376

KEYWORDS: Overlay metrology, Metrology, Lithography, Manufacturing, Semiconducting wafers, Optical lithography, Polarization, Modulation, Critical dimension metrology, Image segmentation

Read Abstract +

Proceedings Article | 20 September 2004 Paper

Optimal pulse duration for femtosecond laser ablation

Yehiam Prior, Kaiyin Zhang, Vladimir Batenkov, Yuri Paskover, Jan-Hendrik Klein-Wiele, Peter Simon

Proceedings Volume 5448, (2004) https://doi.org/10.1117/12.546475

KEYWORDS: Laser ablation, Femtosecond phenomena, Atomic force microscopy, Electrons, Spectroscopy, Silicon, Picosecond phenomena, Ultrafast phenomena, Tellurium, Diagnostics

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years