For advanced nodes, a robust metrology is required to estimate EPE and its contributors. Especially when moving to late process development steps (Ramp-Up and High Volume Manufacturing (HVM)) where inter and intra wafer variations are small but crucial. In this study, we used 8um by 8um SEM images to assess the benefit of large Field-of-View (LFOV) metrology. The result proves the capability of LFOV metrology in capturing not only intra-wafer EPE behavior and its sensitivity to minor variations but also the minor wafer-to-wafer (W2W) variations which is not possible using a small FOV (SFOV) metrology (0.5um by 0.5um) due to larger noise level.
Scanner induced pattern shifts between layers are a large contributor to DRAM Bitline to Active overlay. One of the main root causes for this Pattern Shift non-Uniformity are lens aberrations. Currently measuring the Bitline to Active overlay requires a decap CDSEM method1. In this paper, an in-resist pattern shift uniformity metrology method is proposed which quantifies the main DRAM Bitline to Active overlay without the necessity to decap. We have designed a high transmission reticle (≥ 60%) to measure the pattern shift non-uniformity between two dense gratings under the rotation angle of the Active layer in both cold and hot lens states. Each module on the reticle contains product-like features and a variety of metrology targets, i.e. alignment and overlay, such that the product-to-product and the productto- metrology pattern shift fingerprints can be measured. OPC is applied to enlarge the overlapping process windows of the metrology targets with respect to the product-like features.
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