Mr. Masashi Enomoto Profile

Masashi Enomoto

Researcher at Tokyo Electron Kyushu Ltd

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Author

Publications (11)

Proceedings Article | 26 March 2019 Paper

Novel technologies in coater/developer to enhance the CD stability and to improve the defectivity toward N7 and smaller nodes

Yuya Kamei, Yohei Sano, Takashi Yamauchi, Shinichiro Kawakami, Masahide Tadokoro, Masashi Enomoto, Makoto Muramatsu, Kathleen Nafus, Akihiro Sonoda, Marc Demand, Philippe Foubert

Proceedings Volume 10957, 109571P (2019) https://doi.org/10.1117/12.2514930

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Particles, Stochastic processes, Coating, Extreme ultraviolet lithography, Scanners, Extreme ultraviolet

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Proceedings Article | 26 March 2019 Paper

New method removing SEM image noise to characterize CD and LWR

Shinji Kobayashi, Satoru Shimura, Masashi Enomoto, Robert Kern, Timothy Diller, Tony McDaniel, Nan Qin, Thomas Reay, Roger Serwy

Proceedings Volume 10959, 109592N (2019) https://doi.org/10.1117/12.2514661

KEYWORDS: Line width roughness, Scanning electron microscopy, Image processing, Image analysis, Image filtering, Stochastic processes, Semiconducting wafers, Critical dimension metrology, Gaussian filters

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Proceedings Article | 25 March 2019 Paper

Robustness of interactive pattern fidelity error as a quality metric for integrated patterning

Soichiro Okada, Shinji Kobayashi, Satoru Shimura, Masashi Enomoto, Shota Yoshimura, Kiyohito Ito, Shinya Morikita

Proceedings Volume 10960, 109601P (2019) https://doi.org/10.1117/12.2514663

KEYWORDS: Critical dimension metrology, Optical lithography, Overlay metrology, Etching, Stochastic processes, Semiconducting wafers, Statistical analysis

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Proceedings Article | 10 October 2018 Paper

Improvement of CD stability and defectivity in resist coating and developing process in EUV lithography process

Yuya Kamei, Shinichiro Kawakami, Masahide Tadokoro, Yusaku Hashimoto, Takeshi Shimoaoki, Masashi Enomoto, Kathleen Nafus, Akihiro Sonoda, Philippe Foubert

Proceedings Volume 10809, 1080924 (2018) https://doi.org/10.1117/12.2500896

KEYWORDS: Particles, Critical dimension metrology, Extreme ultraviolet lithography, Coating, Photoresist processing, Semiconducting wafers, Stochastic processes, Scanners, System on a chip, Extreme ultraviolet

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Proceedings Article | 27 March 2018 Presentation + Paper

EUV resist sensitization and roughness improvement by PSCAR with in-line UV flood exposure system

Seiji Nagahara, Michael Carcasi, Gosuke Shiraishi, Yuya Kamei, Kathleen Nafus, Yukie Minekawa, Hiroyuki Ide, Yoshihiro Kondo, Takahiro Shiozawa, Keisuke Yoshida, Masashi Enomoto, Kosuke Yoshihara, Hideo Nakashima, Serge Biesemans, Ryo Shimada, Masaru Tomono, Kazuhiro Takeshita, Teruhiko Moriya, Hayakawa Makoto, Ryo Aizawa, Yoshitaka Konishi, Masafumi Hori, Ken Maruyama, Hisashi Nakagawa, Masayuki Miyake, Tomoki Nagai, Satoshi Dei, Takehiko Naruoka, Motoyuki Shima, Toru Kimura, Geert Vandenberghe, John Petersen, Danilo De Simone, Foubert Philippe, Hans-Jürgen Stock, Balint Meliorisz, Akihiro Oshima, Seiichi Tagawa

Proceedings Volume 10586, 1058606 (2018) https://doi.org/10.1117/12.2297498

KEYWORDS: Ultraviolet radiation, Floods, Picosecond phenomena, Extreme ultraviolet lithography, Calibration, Extreme ultraviolet, Chemically amplified resists, Polymers, Image enhancement, Absorption

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Proceedings Article | 19 March 2018 Paper

Resist coating and developing process technology toward EUV manufacturing sub-7nm node

Yuya Kamei, Takahiro Shiozawa, Shinichiro Kawakami, Hideo Shite, Hiroshi Ichinomiya, Yusaku Hashimoto, Masashi Enomoto, Kathleen Nafus, Akihiro Sonoda, Marc Demand, Philippe Foubert

Proceedings Volume 10583, 105831V (2018) https://doi.org/10.1117/12.2297203

KEYWORDS: Semiconducting wafers, Particles, Critical dimension metrology, Extreme ultraviolet lithography, Extreme ultraviolet, Manufacturing, Photoresist processing, System on a chip, Coating, Yield improvement

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Proceedings Article | 13 March 2018 Paper

Monte Carlo simulation of edge placement error

Shinji Kobayashi, Soichiro Okada, Satoru Shimura, Kathleen Nafus, Carlos Fonseca, Joel Estrella, Masashi Enomoto

Proceedings Volume 10585, 1058529 (2018) https://doi.org/10.1117/12.2297135

KEYWORDS: Semiconducting wafers, Monte Carlo methods, Line width roughness, Critical dimension metrology, Bridges, Statistical analysis, Stochastic processes, Overlay metrology, Semiconductors

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Proceedings Article | 16 October 2017 Paper

Technology for defectivity improvement in resist coating and developing process in EUV lithography process

Yuya Kamei, Takahiro Shiozawa, Shinichiro Kawakami, Hiroshi Ichinomiya, Masashi Enomoto, Kathleen Nafus, Philippe Foubert

Proceedings Volume 10450, 104501F (2017) https://doi.org/10.1117/12.2280388

KEYWORDS: Semiconducting wafers, Extreme ultraviolet lithography, Photoresist processing, Neodymium, Scanners, Coating, Line width roughness, Extreme ultraviolet, High volume manufacturing, Manufacturing

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Proceedings Article | 27 March 2017 Paper

Technology for defectivity improvement in resist coating and developing process in EUV lithography process

Yuya Kamei, Takahiro Shiozawa, Shinichiro Kawakami, Hideo Shite, Hiroshi Ichinomiya, Masashi Enomoto, Kathleen Nafus, Marc Demand, Philippe Foubert

Proceedings Volume 10143, 1014326 (2017) https://doi.org/10.1117/12.2257931

KEYWORDS: Extreme ultraviolet lithography, Photoresist processing, Extreme ultraviolet, Coating, High volume manufacturing, Semiconducting wafers, Neodymium, Particles, System on a chip, Silicon

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Proceedings Article | 27 March 2017 Presentation + Paper

Pattern uniformity control in integrated structures

Shinji Kobayashi, Soichiro Okada, Satoru Shimura, Kathleen Nafus, Carlos Fonseca, Serge Biesemans, Masashi Enomoto

Proceedings Volume 10146, 101461B (2017) https://doi.org/10.1117/12.2257868

KEYWORDS: Critical dimension metrology, Overlay metrology, Semiconductors, Error control coding, Optical lithography, Control systems, Manufacturing equipment, Lithography, Etching, Semiconducting wafers, Bridges, Line width roughness, Reticles, Statistical analysis, Stochastic processes, Data modeling, Digital electronics

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Proceedings Article | 25 March 2016 Paper

Metal containing material processing on coater/developer system

Shinichiro Kawakami, Hiroshi Mizunoura, Koichi Matsunaga, Koichi Hontake, Hiroshi Nakamura, Satoru Shimura, Masashi Enomoto

Proceedings Volume 9779, 97790H (2016) https://doi.org/10.1117/12.2219106

KEYWORDS: Metals, Materials processing, Extreme ultraviolet lithography, Photoresist materials, Extreme ultraviolet, Oxides, Lithography, Metallic coatings, Contamination control, Semiconducting wafers, Contamination, Coating, Neodymium, Particles

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Showing 5 of 11 publications

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