Electron-Beam-Generated Holographic Masks For Optical Vector-Matrix Multiplication

Steven M. Arnold; Steven K. Case

doi:10.1117/12.7973257

1 February 1984 Electron-Beam-Generated Holographic Masks For Optical Vector-Matrix Multiplication

Steven M. Arnold, Steven K. Case

Author Affiliations +

Optical Engineering, Vol. 23, Issue 1, 230179 (February 1984). https://doi.org/10.1117/12.7973257

Abstract

A proposed optical vector-matrix multiplication scheme encodes the matrix elements as a holographic mask consisting of linear diffraction gratings. The binary, chrome-on-glass masks are fabricated by electron-beam lithography. This approach results in a fairly simple optical system that offers both large numerical range and high accuracy. Simple holographic masks have been fabricated and tested.

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Steven M. Arnold and Steven K. Case "Electron-Beam-Generated Holographic Masks For Optical Vector-Matrix Multiplication," Optical Engineering 23(1), 230179 (1 February 1984). https://doi.org/10.1117/12.7973257

Published: 1 February 1984

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