Relationship between slurry flow pattern and removal characteristic based on a novel polishing tool

Bo Zhong; Xian-hua Chen; Zhong-jiang Wen

doi:10.1117/12.2504955

6 February 2019 Relationship between slurry flow pattern and removal characteristic based on a novel polishing tool

Bo Zhong, Xian-hua Chen, Zhong-jiang Wen

Proceedings Volume 10842, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Subdiffraction-limited Plasmonic Lithography and Innovative Manufacturing Technology; 108420U (2019) https://doi.org/10.1117/12.2504955
Event: Ninth International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT2018), 2018, Chengdu, China

Abstract

Slurry plays an important role in the material removal of computer-controlled optical surfacing (CCOS). However, in the high-speed and high-pressure polishing process based on traditional polishing tool, the distribution and flow of the slurry is uncontrollable and the update of slurry in the interface between the polishing tool and the workpiece is difficult, thereby affecting the polishing efficiency. Consequently, this paper proposes a novel polishing tool, which makes the slurry supply to the bottom of the polishing tool actively, thus ensuring the effective update and uniform distribution of the slurry and improving the polishing efficiency. The experimental results based on the novel tool shows that the removal efficiency of the internal slurry flow pattern (ISFP) is higher than that of the external slurry flow pattern (ESFP). In addition, with the increase of rotation speed of polishing tool, the removal efficiency of the ISFP increases approximately linearly, while the removal efficiency of the ESFP increases nonlinearly. Compared with the ESFP, the peak and volume removal efficiencies of the ISFP based on the novel polishing tool are increased by 44% and 40% respectively. The paper demonstrates that the removal efficiency can be improved based on the novel polishing tool, which plays an important role for the high-efficiency manufacturing of large-aperture aspheric optical elements.

Citation Download Citation

Bo Zhong, Xian-hua Chen, and Zhong-jiang Wen "Relationship between slurry flow pattern and removal characteristic based on a novel polishing tool", Proc. SPIE 10842, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Subdiffraction-limited Plasmonic Lithography and Innovative Manufacturing Technology, 108420U (6 February 2019); https://doi.org/10.1117/12.2504955

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