Soft x-ray multilayers fabricated by electron-beam deposition

Masaaki Sudoh; Ryouhei Yokoyama; Mitsuo Sumiya; Masaki Yamamoto; Mihiro Yanagihara; Takeshi Namioka

doi:10.1117/12.23173

1 February 1991 Soft x-ray multilayers fabricated by electron-beam deposition

Masaaki Sudoh, Ryouhei Yokoyama, Mitsuo Sumiya, Masaki Yamamoto, Mihiro Yanagihara, Takeshi Namioka

Proceedings Volume 1343, X-Ray/EUV Optics for Astronomy, Microscopy, Polarimetry, and Projection Lithography; (1991) https://doi.org/10.1117/12.23173
Event: 34th Annual International Technical Symposium on Optical and Optoelectronic Applied Science and Engineering, 1990, San Diego, CA, United States

Abstract

We have investigated the optimum deposition conditions for fabricating Mo/Si multilayers on Si wafers by means of electron-beam deposition, taking the substrate temperature and deposition rate as parameters. Mo/Si multilayers made at substrate temperatures of room temperature to 420 °C and at deposition rates of 0.2-10 A/sec were evaluated by transmission electron micrographs of their cross sections, x-ray diffraction patterns, and their spectral reflectances for soft x-rays of 110-170 A. The optimum deposition parameters were found to be 100-150 °C and 0.2-2 A/sec, respectively, for substrate temperature and deposition rate. The Mo/Si multilayer made under the optimum condition showed fairly smooth layered structure and a reflectance of '3O for unpolarized soft x-ray of 146 A at an incident angle of 200.

Citation Download Citation

Masaaki Sudoh, Ryouhei Yokoyama, Mitsuo Sumiya, Masaki Yamamoto, Mihiro Yanagihara, and Takeshi Namioka "Soft x-ray multilayers fabricated by electron-beam deposition", Proc. SPIE 1343, X-Ray/EUV Optics for Astronomy, Microscopy, Polarimetry, and Projection Lithography, (1 February 1991); https://doi.org/10.1117/12.23173

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KEYWORDS

Temperature metrology

X-rays

Reflectivity

X-ray diffraction

Molybdenum

Silicon

X-ray astronomy

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