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The thermal stability of Mo/Si multilayers for x-ray mirror applications was investigated by annealing studies at relatively low temperatures for various times. The as-deposited and annealed multilayers were examined using conventional small and large angle x-ray diffraction, normal incidence x-ray reflectance measurements using a synchrotron source, selected area electron diffraction, and high-resolution electron microscopy. The as-deposited structure consists of pure layers of crystalline Mo and amorphous Si separated by thin regions of amorphous Mo-Si. At temperatures between 200 - 400 degree(s)C the amorphous Mo-Si interlayers grow and hexagonal MoSi2 forms by a thermally activated process(es) and the bilayer spacing and x-ray reflectivity decrease. A determination of the effective activation energy of the process(es) suggests long-term stability at the mirror operating temperature, although additional low temperature testing is warranted.
Robert S. Rosen,Michael A. Viliardos,M. E. Kassner,Daniel Gorman Stearns, andStephen P. Vernon
"Thermal stability of Mo/Si multilayers", Proc. SPIE 1547, Multilayer Optics for Advanced X-Ray Applications, (1 January 1992); https://doi.org/10.1117/12.51281
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Robert S. Rosen, Michael A. Viliardos, M. E. Kassner, Daniel Gorman Stearns, Stephen P. Vernon, "Thermal stability of Mo/Si multilayers," Proc. SPIE 1547, Multilayer Optics for Advanced X-Ray Applications, (1 January 1992); https://doi.org/10.1117/12.51281