Magnetron sputtered EUV mirrors with high-thermal stability

Torsten Feigl; Sergey A. Yulin; Norbert Kaiser; Roland Thielsch

doi:10.1117/12.390079

21 July 2000 Magnetron sputtered EUV mirrors with high-thermal stability

Torsten Feigl, Sergey A. Yulin, Norbert Kaiser, Roland Thielsch

Proceedings Volume 3997, Emerging Lithographic Technologies IV; (2000) https://doi.org/10.1117/12.390079
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

Many applications of multilayers in the EUV spectral region require not only high normal incidence reflectivity but also high thermal stability. We instigated the thermal stability of Mo/Si multilayers in comparison with the new material combination Mo₂C/Si in the temperature range from 200 degrees Celsius to 700 degrees Celsius. Additionally, we deposited and studied Mo/Si multilayers having Mo₂C diffusion barriers with 0.6 nm single layer thickness. The multilayer mirrors were designed for normal incidence reflectivity at about 13 nm wavelength and were deposited by dc magnetron sputtering. X-ray scattering, transmission electron microscopy and atomic force microscopy were used for characterization of the multilayer structures. The results are correlated to the measured normal incidence reflectivity using synchrotron radiation. We achieved maximal normal incidence reflectivities of 61.8% 13.0 nm wavelength for Mo₂C/Si and 59.9% 13.3 nm for Mo/Si multilayers having Mo₂C diffusion barriers. While the reflectivity of Mo/Si multilayers decreased considerably after annealing above 300 degrees Celsius the Mo₂C/Si multilayers showed a superior thermal stability up to 600 degrees Celsius.

Citation Download Citation

Torsten Feigl, Sergey A. Yulin, Norbert Kaiser, and Roland Thielsch "Magnetron sputtered EUV mirrors with high-thermal stability", Proc. SPIE 3997, Emerging Lithographic Technologies IV, (21 July 2000); https://doi.org/10.1117/12.390079

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