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Vanadium oxide (VOx) thin films were deposited on different substrates by reactive DC magnetron sputtering. Silicon
substrate, Si3N4/Si substrate, glass substrate, and α-Al2O3 substrate were adopted in experiments. Results revealed that
the structural features of VOx thin films strongly depend on the substrates. Analysis of square resistance and its
temperature dependence demonstrated that the crystal structure and the growth mode of VOx films play important roles
in the film electrical properties. Experiments demonstrated that substrates have great influence on the growth mode and
thermal resistance properties of VOx thin films.
Xiongbang Wei,Zhiming Wu,Xiangdong Xu,Tao Wang,Jingjing Tang, andYadong Jiang
"Substrate effect on the growth and thermal electrical properties of vanadium oxide thin films", Proc. SPIE 6984, Sixth International Conference on Thin Film Physics and Applications, 69842J (11 March 2008); https://doi.org/10.1117/12.792139
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Xiongbang Wei, Zhiming Wu, Xiangdong Xu, Tao Wang, Jingjing Tang, Yadong Jiang, "Substrate effect on the growth and thermal electrical properties of vanadium oxide thin films," Proc. SPIE 6984, Sixth International Conference on Thin Film Physics and Applications, 69842J (11 March 2008); https://doi.org/10.1117/12.792139