Research on antireflection characteristic of rectangular subwavelength surface-relief structure

Weimin Tan; Chun-hua Lu; Zhongzi Xu; Yaru Ni

doi:10.1117/12.830992

21 May 2009 Research on antireflection characteristic of rectangular subwavelength surface-relief structure

Weimin Tan, Chun-hua Lu, Zhongzi Xu, Yaru Ni

Proceedings Volume 7282, 4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 72822M (2009) https://doi.org/10.1117/12.830992
Event: AOMATT 2008 - 4th International Symposium on Advanced Optical Manufacturing, 2008, Chengdu, Chengdu, China

Abstract

In this paper, using effective-medium theory (EMT) and finite different time domain (FDTD), the dependence of reflectivity to 1.06 μm incident light upon structural parameters of rectangular subwavelength surface-relief structure has been discussed, the reliability of FDTD has been proved, and the validity of the two theories has been contrasted. The influence of refractive index and filled factor to reflectivity has been analyzed detailedly. And the structural parameters also have been discussed by diffraction orders in the energy field of reflective area with FDTD. The results shows that the best filled factor is near 0.7, the structure periods should less than 0.6λ, and the structure thickness would be set to λ/4neff. It can be used as the basis for design and fabrication of surface structural materials with proper antireflection property.

Citation Download Citation

Weimin Tan, Chun-hua Lu, Zhongzi Xu, and Yaru Ni "Research on antireflection characteristic of rectangular subwavelength surface-relief structure", Proc. SPIE 7282, 4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 72822M (21 May 2009); https://doi.org/10.1117/12.830992

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