Fabrication process of Si microlenses for OCT systems

A. Jovic; G. Pandraud; K. Zinoviev; J. L. Rubio; E. Margallo; P. M. Sarro

doi:10.1117/12.2227898

27 April 2016 Fabrication process of Si microlenses for OCT systems

A. Jovic, G. Pandraud, K. Zinoviev, J. L. Rubio, E. Margallo, P. M. Sarro

Proceedings Volume 9888, Micro-Optics 2016; 98880C (2016) https://doi.org/10.1117/12.2227898
Event: SPIE Photonics Europe, 2016, Brussels, Belgium

Abstract

We present Si microlenses fabricated using dry ICP plasma etching of silicon and thermal photoresist reflow. The process is insensitive to thermal reflow time and it can be easily incorporated into fabrication flows for complex optical systems. Using this process, we were able to fabricate microlenses with diameter of 150 μm, radius of curvature of 682 μm and with a surface roughness of only 25 nm.

Citation Download Citation

A. Jovic, G. Pandraud, K. Zinoviev, J. L. Rubio, E. Margallo, and P. M. Sarro "Fabrication process of Si microlenses for OCT systems", Proc. SPIE 9888, Micro-Optics 2016, 98880C (27 April 2016); https://doi.org/10.1117/12.2227898

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available