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Claus Westermann
at GFMesstechnik GmbH
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Publications (1)
Proceedings Article | 3 October 2003 Paper
Interferometric measuring device with 2D analyzing for real-time and in situ plasma etching in the production of microsystem components
Claus Westermann, Mai Chen, Gottfried Frankowski, Wilfred John, Harald Wittrich
Proceedings Volume 5145, (2003) https://doi.org/10.1117/12.500129
KEYWORDS: Semiconducting wafers, Etching, Cameras, Interferometers, Interferometry, Wafer-level optics, Plasma etching, Photomasks, Microsystems, Measurement devices
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