Evaluation Of Deep-UV Proximity Mode Printing

D. O. Massetti; M. A. Hockey; D. L. McFarland

doi:10.1117/12.958621

5 September 1980 Evaluation Of Deep-UV Proximity Mode Printing

D. O. Massetti, M. A. Hockey, D. L. McFarland

Proceedings Volume 0221, Developments in Semiconductor Microlithography V; (1980) https://doi.org/10.1117/12.958621
Event: Semiconductor Microlithography V, 1980, San Jose, United States

Abstract

Proximity mode printing technology has the potential to achieve adequate defect levels for economical fabrication of VLSI devices. The application of deep-UV to proximity mode printing is evaluated in order to extend achievable resolution to greater wafer-to-mask separations. This technique promises to be a viable supplemental technology to wafer stepper technology.

Citation Download Citation

D. O. Massetti, M. A. Hockey, and D. L. McFarland "Evaluation Of Deep-UV Proximity Mode Printing", Proc. SPIE 0221, Developments in Semiconductor Microlithography V, (5 September 1980); https://doi.org/10.1117/12.958621

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available