Performance Evaluation Of A Practical 248nm Wafer Stepper

Kenneth F. Walsh; Michael M. Dunn; David S. Holbrook; John H. Bruning

doi:10.1117/12.940401

1 September 1987 Performance Evaluation Of A Practical 248nm Wafer Stepper

Kenneth F. Walsh, Michael M. Dunn, David S. Holbrook, John H. Bruning

Proceedings Volume 0774, Lasers in Microlithography; (1987) https://doi.org/10.1117/12.940401
Event: Microlithography Conferences, 1987, Santa Clara, CA, United States

Abstract

Optical steppers are expected by many workers to be applicable to design rules below 0.5 micrometers. In 1986 workers at Bell Labs reported exposure of features below 0.5 micrometers using a GCA optical stepper, incorporating an excimer laser source and a refractive Tropel lens designed to operate at 248nm. In addition to a light source, lens, wafer chuck and stages, a practical wafer stepper must incorporate alignment systems, reticle and wafer handling and control systems. If the stepper is illuminated by an excimer laser, safety systems must also be provided for protection from laser light, toxic gasses, and high voltage. The system should also be configured to enhance usability and maintainablity. We will discuss the concept and performance of such a stepper system, with emphasis on the performance of lens and illuminator.

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Kenneth F. Walsh, Michael M. Dunn, David S. Holbrook, and John H. Bruning "Performance Evaluation Of A Practical 248nm Wafer Stepper", Proc. SPIE 0774, Lasers in Microlithography, (1 September 1987); https://doi.org/10.1117/12.940401

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