Paper
1 July 2002 Fully automated interference lithography
Bruce D. McLeod, Adam F. Kelsey, Mark A. Leclerc, Daniel P. Resler, Sergey Liberman, James P. Nole
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Abstract
Interferometric Lithography has long been considered a viable means to achieve sub-micron resolution lithography over large areas without the use of traditional photomasks. However, traditional IL configurations set up in laboratories on optical isolation tables requires sophisticated optical designs and are greatly limited in both throughput and yield due to these complexities and manual configurations. The Microphotonics Group at OSC has introduced a series of fully automated interference lithography based tool systems that can achieve resolution down to 190 nm period and address a multitude of applications requiring sub-micron resolution in a high- throughput, stabile, manufacturing environment.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Bruce D. McLeod, Adam F. Kelsey, Mark A. Leclerc, Daniel P. Resler, Sergey Liberman, and James P. Nole "Fully automated interference lithography", Proc. SPIE 4688, Emerging Lithographic Technologies VI, (1 July 2002); https://doi.org/10.1117/12.472277
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Cited by 2 scholarly publications.
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KEYWORDS
Lithography

Semiconducting wafers

Beam splitters

Spatial filters

Photoresist materials

Calibration

Beam delivery

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