Use of direct washing of chemical dispense nozzle for defect control

Michael Linnane; George Mack; Christopher Longstaff; Thomas Winter

doi:10.1117/12.656534

29 March 2006 Use of direct washing of chemical dispense nozzle for defect control

Michael Linnane, George Mack, Christopher Longstaff, Thomas Winter

Proceedings Volume 6153, Advances in Resist Technology and Processing XXIII; 61533D (2006) https://doi.org/10.1117/12.656534
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

Demands for continued defect reduction in 300mm IC manufacturing are driving process engineers to examine all aspects of the chemical apply process for improvement. Historically, the defect contribution from photoresist apply nozzles has been minimized through a carefully controlled process of "dummy dispenses" to keep the photoresist in the tip "fresh" and remove any solidified material, a preventive maintenance regime involving periodic cleaning or replacing of the nozzles, and reliance on a pool of solvent within the nozzle storage block to keep the photoresist from solidifying at the nozzle tip. The industry standard has worked well for the most part but has limitations in terms of cost effectiveness and absolute defect elimination. In this study, we investigate the direct washing of the chemical apply nozzle to reduce defects seen on the coated wafer. Data is presented on how the direct washing of the chemical dispense nozzle can be used to reduce coating related defects, reduce material costs from the reduction of "dummy dispense", and can reduce equipment downtime related to nozzle cleaning or replacement.

Citation Download Citation

Michael Linnane, George Mack, Christopher Longstaff, and Thomas Winter "Use of direct washing of chemical dispense nozzle for defect control", Proc. SPIE 6153, Advances in Resist Technology and Processing XXIII, 61533D (29 March 2006); https://doi.org/10.1117/12.656534

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