Mr. Anthony D. Manni Profile

Anthony D. Manni

PhD Candidate @ BU / CTO @ TelAztec

SPIE Involvement:

Author

Area of Expertise:

Random AR nano-texture , Plasma etching , Integrated Photonics , Metasurface Design , Nanophotonics Modeling , Interference Lithography

Websites:

Company Website

CTO of TelAztec LLC, with 8 years experience working in theoretical and practical development of metasurface-based optical components, such as RAR nano-textured optics and nano-structured optical filters.
Manni earned a MSc. in Photonic Materials from Boston University in 2023, and is currently pursuing a PhD in Electro Physics at BU's ECE department, where he is developing novel quantum photonic integrated circuits.

Proceedings Article | 4 October 2024 Presentation + Paper

Directionally unbiased nanophotonic waveguide multiports for integrated quantum photonics applications

Anthony Manni, Christopher Schwarze, David Simon, Abdoulaye Ndao, Alexander Sergienko

Proceedings Volume 13120, 1312004 (2024) https://doi.org/10.1117/12.3027684

KEYWORDS: Reflection, Quantum photonics, Beam splitters, Photonic integrated circuits, Mathematical optimization, Waveguides, Quantum devices, Electric fields, Quantum nanophotonics

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Proceedings Article | 4 October 2024 Presentation + Paper

Optical properties of RAR nano-textured diamond for commercial LWIR applications

Anthony Manni, Hayden Small, Stephen Consoles, Bruce MacLeod, Douglas Hobbs

Proceedings Volume 13116, 1311606 (2024) https://doi.org/10.1117/12.3028539

KEYWORDS: Diamond, Long wavelength infrared, Windows, Etching, Reflection, Quantum processes, Plasma etching, Optical transmission, Optical surfaces, Optical properties

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Proceedings Article | 4 October 2024 Presentation

Higher-dimensional HOM effect with directionally unbiased linear-optical multiports enable entangled state routing in quantum networks

Alexander Sergienko, David Simon, Anthony Manni, Christopher Schwarze, Abdoulaye Ndao

Proceedings Volume PC13148, PC1314806 (2024) https://doi.org/10.1117/12.3027277

KEYWORDS: Quantum networks, Entangled states, Quantum entanglement, Quantum control, Quantum amplitude, Photons, Optical networks, Beam splitters, Transportation, Quantum walks

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Proceedings Article | 30 September 2024 Paper

Superresolution interferometric phase measurements with directionally unbiased linear-optical devices

Christopher Schwarze, Anthony Manni, David Simon, Abdoulaye Ndao, Alexander Sergienko

Proceedings Volume 13135, 1313506 (2024) https://doi.org/10.1117/12.3027679

KEYWORDS: Michelson interferometers, Phase measurement, Super resolution, Matrices, Electromagnetic scattering, Phase interferometry, Light scattering, Interferometers

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Proceedings Article | 18 July 2024 Poster + Paper

Half-wave plate characterizations for the Keck NIRC2 polarimetry mode

William Melby, Manxuan Zhang, Maxwell Millar-Blanchaer, Anthony Manni, Douglas Hobbs, Jaren Ashcraft

Proceedings Volume 13096, 1309637 (2024) https://doi.org/10.1117/12.3019556

KEYWORDS: Mueller matrices, Wave plates, Polarimetry, Polarization, Calibration, Quartz, Matrices, Sensors

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Proceedings Article | 2 December 2022 Presentation + Paper

RAR nano-textured diamond pulsed LIDT

Anthony Manni, Bruce MacLeod, Douglas Hobbs

Proceedings Volume 12300, 1230008 (2022) https://doi.org/10.1117/12.2641596

KEYWORDS: Diamond, Chemical vapor deposition, Absorption, Plasma etching, Reflectivity, Plasma, Etching, Laser induced damage, Thin film coatings, Laser damage threshold, Antireflective coatings

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Proceedings Article | 2 December 2022 Presentation + Paper

Impact of a plasma mitigation process on the 266 nm pulsed LiDT of RAR nano-textured fused silica

Amile Zaaf, Hayden Small, Tadd LeRocque, Andrew Robson, Anthony Manni, Douglas Hobbs

Proceedings Volume 12300, 123000B (2022) https://doi.org/10.1117/12.2642768

KEYWORDS: Absorption, Silica, Laser damage threshold, Plasma, Windows, Etching, Polishing, Optics, Thin films, Deep ultraviolet

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The pulsed laser induced damage threshold (LiDT) of Random Anti-Reflective (RAR) nano-textured fused silica optics has been shown to be many times higher than thin-film AR coated optics at wavelengths ranging from the near UV through the NIR. Because an RAR nano-texture is formed by a plasma etch process that removes part of the optic surface, the observed increase in damage resistance has kept track with the LiDT advances attained by low roughness super-polishing and damage pre-cursor mitigation techniques. In this work, nano-second pulse LiDT testing of RAR nano-textured optics was conducted at the deep UV wavelength of 266nm. The effect on 266nm LiDT of the uniform removal of additional surface material from fused silica optics using a dry plasma etch process was investigated. This plasma-polishing (PP), pre-RAR process was varied using fluorine-based chemistries that removed 100-300nm of material from each test surface, with surface roughness then characterized using white-light interferometry. Photothermal interferometry confirmed that no surface absorption was added by the PP, RAR, and PP-RAR plasma etching. Both standard grade, and ultra-low bulk absorption (low-OH) fused silica were included in the tests. RAR nanotextured surfaces showed an average damage threshold of 8.4 J/cm², a level 3 times higher than a commercially available thin-film AR coated surface. Unexpected from pulsed LiDT testing at many longer wavelengths, all plasma etched surfaces exhibited less than half the damage threshold of the untreated, as-polished fused silica surfaces, and there was no observed correlation with surface roughness or plasma etch depth. From work by others it was theorized that exposure to the deep UV photons generated by the plasma might induce absorptive electronic defects in the fused silica material that could explain the reduced damage resistance relative to non-exposed surfaces. As an initial test of this concept an RAR nano-textured sample was baked at 400C to remove the suspected electronic defect. The subsequent pulsed LiDT of this one annealed sample was found to be 15.5 J/cm², nearly double that of all other plasma etched samples. Further work to confirm this result is on-going.

Proceedings Article | 16 November 2018 Paper

Pulsed laser damage resistance of nano-structured polarizers for 1064nm

Douglas Hobbs, Bruce MacLeod, Anthony Manni, Stephen Consoles

Proceedings Volume 10805, 108051E (2018) https://doi.org/10.1117/12.2500339

KEYWORDS: Silica, Magnesium fluoride, Absorption, Refractive index, Reflection, Tantalum, Laser induced damage

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Proceedings Article | 23 November 2017 Paper

CW laser damage testing of RAR nano-textured fused silica and YAG

Bruce MacLeod, Douglas Hobbs, Anthony Manni, Ernest Sabatino, David Bernot, Sage DeFrances, Joseph Randi, Jeffrey Thomas

Proceedings Volume 10447, 1044705 (2017) https://doi.org/10.1117/12.2280498

KEYWORDS: Absorption, Thin films, YAG lasers, Continuous wave operation, Thin film coatings, Silica, Laser induced damage, Antireflective coatings, Laser damage threshold, Nanophotonics, Photonic microstructures

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A study of the continuous wave (CW) laser induced damage threshold (LiDT) of fused silica and yttrium aluminum garnet (YAG) optics was conducted to further illustrate the enhanced survivability within high power laser systems of an anti-reflection (AR) treatment consisting of randomly distributed surface relief nanostructures (RAR). A series of three CW LiDT tests using the 1070nm wavelength, 16 KW fiber laser test bed at Penn State Electro-Optic Center (PSEOC) were designed and completed, with improvements in the testing protocol, areal coverage, and maximum exposure intensities implemented between test cycles. Initial results for accumulated power, stationary site exposures of RAR nano-textured optics showed no damage and low surface temperatures similar to the control optics with no AR treatment. In contrast, optics with thin-film AR coatings showed high surface temperatures consistent with absorption by the film layers. Surface discriminating absorption measurements made using the Photothermal Common-path Interferometry (PCI) method, showed zero added surface absorption for the RAR nanotextured optics, and absorption levels in the 2-5 part per million range for thin-film AR coated optics. In addition, the surface absorption of thin-film AR coatings was also found to have localized absorption spikes that are likely pre-cursors for damage. Subsequent CW LiDT testing protocol included raster scanning an increased intensity focused beam over the test optic surface where it was found that thin-film AR coated optics damaged at intensities in the 2 to 5 MW/cm² range with surface temperatures over 250C during the long-duration exposures. Significantly, none of the 10 RAR nano-textured fused silica optics tested could be damaged up to the maximum system intensity of 15.5 MW/cm², and surface temperatures remained low. YAG optics tested during the final cycle exhibited a similar result with RAR nano-textured surfaces surviving intensities over 3 times higher than thin-film AR coated surfaces. This result was correlated with PCI measurements that also show zero-added surface absorption for the RAR nano-textured YAG optics.

Proceedings Article | 21 November 2017 Paper

Pulsed laser damage resistance of nano-structured high reflectors for 355nm

Douglas Hobbs, Bruce MacLeod, Anthony Manni

Proceedings Volume 10447, 104470W (2017) https://doi.org/10.1117/12.2280572

KEYWORDS: Photonic microstructures, Nanotechnology, Silica, Absorption, Reflection, Laser induced damage, Laser damage threshold, Prototyping, Reflectors, Thin films

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