Dr. Boris Menchtchikov Profile

Dr. Boris Menchtchikov

at ASML

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 27 April 2023 Presentation + Paper

Alignment and overlay through opaque metal layers

V. Blanco Carballo, E. Canga, C. Jehoul, A. Moussa, A. Tamaddon, C. Tabery, G. Gunjala, B. Menchtchikov, V. Zacca, S. Lalbahadoersing, A. den Boef, R. Synowicki

Proceedings Volume 12496, 124960I (2023) https://doi.org/10.1117/12.2658084

KEYWORDS: Ruthenium, Optical alignment, Semiconducting wafers, Overlay metrology, Oxides, Silicon, Metals, Etching, Scanners, Copper

Read Abstract +

Proceedings Article | 20 March 2019 Paper

Holistic feedforward control for the 5 nm logic node and beyond

Henry Megens, Ralph Brinkhof, Igor Aarts, Haico Kok, Leendertjan Karssemeijer, Gijs ten Haaf, Shawn Lee, Daan Slotboom, Chris de Ruiter, Irina Lyulina, Simon Huisman, Stefan Keij, Evert Mos, Wim Tel, Manouk Rijpstra, Emil Schmitt-Weaver, Kaustuve Bhattacharyya, Robert Socha, Boris Menchtchikov, Michael Kubis, Jan Mulkens

Proceedings Volume 10961, 109610K (2019) https://doi.org/10.1117/12.2515449

KEYWORDS: Lithographic process control, Semiconducting wafers, Optical alignment, Overlay metrology, Sensors, Distortion, Scanners, Logic, Metrology, Process control

Read Abstract +

Proceedings Article | 20 March 2018 Paper

Reduction in overlay error from mark asymmetry using simulation, ORION, and alignment models

Boris Menchtchikov, Robert Socha, Chumeng Zheng, Sudhar Raghunathan, Igor Aarts, Krishanu Shome, Jonathan Lee, Chris de Ruiter, Manouk Rijpstra, Henry Megens, Ralph Brinkhof, Floris Teeuwisse, Leendertjan Karssemeijer, Irina Lyulina, Chung-Tien Li, Jan Hermans, Philippe Leray

Proceedings Volume 10587, 105870C (2018) https://doi.org/10.1117/12.2297493

KEYWORDS: Optical alignment, Monte Carlo methods, Overlay metrology, Polarization, Sensors, Chemical mechanical planarization, Etching, Scanners

Read Abstract +

Proceedings Article | 30 March 2017 Paper

Computational scanner wafer mark alignment

Boris Menchtchikov, Robert Socha, Sudharshanan Raghunathan, Irina Lyulina, Hielke Schoonewelle, Patrick Tinnemans, Paul Tuffy, Philippe Leray, Christiane Jehoul

Proceedings Volume 10147, 101471C (2017) https://doi.org/10.1117/12.2259750

KEYWORDS: Far infrared, Optical alignment, Semiconducting wafers, Sensors, Signal detection, Avalanche photodetectors, Signal processing, Scanners, Optical lithography, Overlay metrology

Read Abstract +

Proceedings Article | 24 March 2016 Paper

Improving scanner wafer alignment performance by target optimization

Philippe Leray, Christiane Jehoul, Robert Socha, Boris Menchtchikov, Sudhar Raghunathan, Eric Kent, Hielke Schoonewelle, Patrick Tinnemans, Paul Tuffy, Jun Belen, Rich Wise

Proceedings Volume 9778, 97782M (2016) https://doi.org/10.1117/12.2219491

KEYWORDS: Optical alignment, Semiconducting wafers, Overlay metrology, Scanners, Etching, Avalanche photodetectors, Optical lithography, Silicon, Metrology, Chemical mechanical planarization

Read Abstract +

Proceedings Article | 12 April 2013 Paper

High order field-to-field corrections for imaging and overlay to achieve sub 20-nm lithography requirements

Jan Mulkens, Michael Kubis, Paul Hinnen, Roelof de Graaf, Hans van der Laan, Alexander Padiy, Boris Menchtchikov

Proceedings Volume 8683, 86831J (2013) https://doi.org/10.1117/12.2011550

KEYWORDS: Semiconducting wafers, Scanners, Overlay metrology, Metrology, Lithography, Actuators, Calibration, Reticles, Photomasks, Control systems

Read Abstract +

Showing 5 of 6 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years