The research proposal was used the electron-gun evaporation with ion-assisted deposition method to deposit zirconium dioxide (ZrO2) thin films on PET and PC flexible substrates. Then, the finite element method (FEM) with equivalent room temperature (ERT) could simulated the intrinsic stress of these AR multi-layer films. The self-made phase-shifting Moiré interferometer can verify the residual stress of these AR multilayer films. However, a polynomial fixing curvature was used to reduce the simulation error of intrinsic stress low to 1%. The residual stress of AR multilayer films deposited with electron-gun evaporation can be reduced to -279.3MPa.
The high & low refractive index (Nb2O5/SiO2)2 multi-layer films were deposited by E-gun evaporation with ion-beam assisted deposition (IAD) on flexible PET substrate. The optical property and anisotropic residual stress were investigated. The residual stress of each layer film was measured step by step with self-made shadow moiré interferometer. The experimental results showed the optimal oxygen flow of Nb2O5 and SiO2 were 20 and 25 sccm, respectively, for the absorption coefficient less than 10-3. The principle stresses were changed from tensor to compressor stress from 6,665 to - 916MPa for one layer to (HL)2 four layers. The shearing stresses were all tensor stresses from 5,876 to 406 MPa for one layer to (HL)2 four layers. The multi-layer films real reduced the residual stress.
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