Mr. Clayton Bargsten Profile

Clayton Bargsten

at KMLabs Inc

SPIE Involvement:

Author

Publications (2)

Proceedings Article | 22 February 2021 Presentation

Introduction to imec's AttoLab for ultrafast kinetics of EUV exposure processes and ultra-small pitch lithography

Fabian Holzmeier, Kevin Dorney, Esben Larsen, Thomas Nuytten, Dhirendra Singh, Michiel van Setten, Pieter Vanelderen, Clayton Bargsten, Seth Cousin, Daisy Raymondson, Eric Rinard, Rod Ward, Henry Kapteyn, Stefan Böttcher, Oleksiy Dyachenko, Raimund Kremzow, Marko Wietstruk, Geoffrey Pourtois, Paul van der Heide, John Petersen

Proceedings Volume 11610, 1161010 (2021) https://doi.org/10.1117/12.2595038

KEYWORDS: Lithography, Extreme ultraviolet lithography, Ultrafast phenomena, Photoemission spectroscopy, Coherence imaging, Semiconducting wafers, Radiometry, Extreme ultraviolet, Time resolved spectroscopy, Spectroscopy

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Proceedings Article | 22 February 2021 Presentation

Lloyd’s mirror interference lithography below a 22-nm pitch with an accessible, tabletop, 13.5 nm high-harmonic EUV source

Kevin Dorney, Sonia Castellanos, Esben Larsen, Fabian Holzmeier, Dhirendra Singh, Nadia Vandenbroeck, Danilo De Simone, Peter De Schepper, Alessandro VaglioPret, Clayton Bargsten, Seth Cousin, Daisy Raymondson, Eric Rinard, Rod Ward, Henry Kaptyen, Thomas Nuytten, Paul Van der Heide, John Petersen

Proceedings Volume 11610, 1161011 (2021) https://doi.org/10.1117/12.2595048

KEYWORDS: Lithography, Extreme ultraviolet, Mirrors, Extreme ultraviolet lithography, Ultrafast phenomena, Photoresist materials, Yield improvement, Semiconductor manufacturing, Semiconducting wafers, Scanning electron microscopy

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