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Dan Schumacher
Tech Dir at Siemens EDA
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Author
Publications (2)
Proceedings Article | 24 March 2017 Presentation + Paper
Enhanced OPC recipe coverage and early hotspot detection through automated layout generation and analysis
Ayman Hamouda, Mohamed Bahnas, Dan Schumacher, Ioana Graur, Ao Chen, Kareem Madkour, Hussein Ali, Jason Meiring, Neal Lafferty, Chris McGinty
Proceedings Volume 10147, 101470R (2017) https://doi.org/10.1117/12.2260769
KEYWORDS: Optical proximity correction, Optical lithography, Semiconductor manufacturing, Photomasks, Computational lithography, Databases, Resolution enhancement technologies, Visualization, Semiconducting wafers, Design for manufacturing, Cadmium
Proceedings Article | 18 March 2015 Paper
Practical DTCO through design/patterning exploration
Neal Lafferty, Jason Meiring, Mohamed Bahnas, Joseph O'Neill, Toshikazu Endo, Dan Schumacher, James Culp, Glenn Wawrzynski, Gurpreet Lamba, Kostas Adam, John Sturtevant, Chris McGinty
Proceedings Volume 9427, 942710 (2015) https://doi.org/10.1117/12.2086355
KEYWORDS: Optical proximity correction, Optical lithography, Visualization, Photovoltaics, Legal, Resolution enhancement technologies, Manufacturing, Aerospace engineering, Metals, Databases
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