Mr. Jake Kaminsky Profile

Jake Kaminsky

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Publications (5)

Proceedings Article | 6 April 2020 Presentation + Paper

Strategies for aggressive scaling of EUV multi-patterning to sub-20 nm features

Ashim Dutta, Jennifer Church, Joe Lee, Brendan O’Brien, Luciana Meli, Chi Chun Liu, Saumya Sharma, Karen Petrillo, Cody Murray, Eric Liu, Katie Lutker-Lee, Qiaowei Lou, Chris Cole, Angélique Raley, Akiteru Ko, Subhadeep Kal, Jake Kaminsky, Aelan Mosden, Henan Zhang, Shan Hu, Lior Huli, Naoki Shibata, Dave Hetzer, Chia-Yun (Sharon) Hsieh

Proceedings Volume 11323, 113230V (2020) https://doi.org/10.1117/12.2551727

KEYWORDS: Line edge roughness, Lithography, Etching, Amorphous silicon, Extreme ultraviolet, Oxidation, Extreme ultraviolet lithography, Optical lithography, Scanning electron microscopy, Critical dimension metrology

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SPIE Journal Paper | 23 July 2018

Electron trapping: a mechanism for acid production in extreme ultraviolet photoresists

Steven Grzeskowiak, Jake Kaminsky, Sean Gibbons, Amrit Narasimhan, Robert Brainard, Greg Denbeaux

JM3, Vol. 17, Issue 03, 033501, (July 2018) https://doi.org/10.1117/12.10.1117/1.JMM.17.3.033501

KEYWORDS: Polymers, Extreme ultraviolet lithography, Extreme ultraviolet, Photoresist materials, Molecules, Absorbance, Chemical reactions, Absorption, Spectroscopy, Electrodes

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Proceedings Article | 28 March 2018 Paper

Investigating the threshold electron energy for reactions in EUV resist materials

Jake Kaminsky, Steven Grzeskowiak, Sean Gibbons, Jonathan Chandonait, Ulrich Welling, Lawrence Melvin, Yudhishthir Kandel, Robert Brainard, Greg Denbeaux

Proceedings Volume 10586, 105861N (2018) https://doi.org/10.1117/12.2297386

KEYWORDS: Photoresist materials, Extreme ultraviolet lithography, Ionizing radiation, Radiation effects, Electrons, Photons, Polymers, Extreme ultraviolet, Photoresist developing, Standards development

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Proceedings Article | 21 March 2018 Presentation + Paper

Polymer effects on PAG acid yield in EUV resists

Steven Grzeskowiak, Jake Kaminsky, Sean Gibbons, Michael Murphy, Jonathan Chandonait, Robert Brainard, Greg Denbeaux

Proceedings Volume 10586, 105860D (2018) https://doi.org/10.1117/12.2297692

KEYWORDS: Electrons, Polymers, Extreme ultraviolet lithography, Molecules, Extreme ultraviolet, Absorbance, Absorption, Photoresist materials, Polymethylmethacrylate, Liquids

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Proceedings Article | 27 March 2017 Paper

Analytical techniques for mechanistic characterization of EUV photoresists

Steven Grzeskowiak, Amrit Narasimhan, Michael Murphy, Christian Ackerman, Jake Kaminsky, Robert Brainard, Greg Denbeaux

Proceedings Volume 10146, 101462C (2017) https://doi.org/10.1117/12.2274128

KEYWORDS: Extreme ultraviolet lithography, Photoresist materials, Spectroscopy, Extreme ultraviolet, FT-IR spectroscopy, Absorption, Absorption spectroscopy, Lithography, Mass spectrometry, Electrons, Silicon, Hydrogen, Molecules, Photodiodes

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