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Jin Youp Kim
at Dongbu HiTek Co Ltd
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Publications (1)
Proceedings Article | 11 April 2006 Paper
Transistor fabrication for sub-90 nm transistor by using trim technology at ArF light source
Proceedings Volume 6153, 61532Z (2006) https://doi.org/10.1117/12.657078
KEYWORDS: Etching, Photoresist materials, Line edge roughness, Lithography, Transistors, Photomasks, Process control, Silicon, Resistance, Optical lithography
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