Exposure of binary masks using ArF (193nm) photolithography processing is a common practice for layers with less critical imaging requirements, but they may experience obstacles for high volume manufacturing; mainly defectivity or requalification cost concerns. The usage of chrome on glass (COG) mask types under ArF wavelength exposure has been shown to lead to chrome migration issues, impacting mask integrity and critical dimensions (CDs) on wafer. While not experiencing the same defectivity concerns as COG, using opaque MoSi on glass (OMOG) as a replacement greatly increases the cost to build the mask but reduces the requalification efforts. We have observed that attenuated phase shift masks (PSMs) built for KrF wavelength (248nm) exposure show the same functional performance as a binary mask under ArF exposure for 45nm node technology. Initial feasibility investigation involved simulating wafer exposure with an OMOG mask and a KrF PSM mask under the same conditions. To demonstrate wafer performance, masks with and without 2nd level processing were built to verify exposure and tool handling capabilities. The application of KrF PSM as a binary mask under ArF photolithography processing for less critical layers of mature technology nodes shows to maintain pattern integrity at a lower total lifetime cost, compared to COG or OMOG, while providing comparable results on wafer.
This conference presentation was prepared for the Advanced Etch Technology and Process Integration for Nanopatterning XII conference at SPIE Advanced Lithography + Patterning 2023.
Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks.
You are receiving this notice because your organization may not have SPIE eBooks access.*
*Shibboleth/Open Athens users─please
sign in
to access your institution's subscriptions.
To obtain this item, you may purchase the complete book in print or electronic format on
SPIE.org.
INSTITUTIONAL Select your institution to access the SPIE Digital Library.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.