This course provides attendees with a working knowledge of photomask technology. The course focuses on process flow with emphasis in the challenges associated with design data conversions, lithography, process, metrology, inspection, and advanced mask manufacture. Although an entry-level course, the following topics are reviewed in considerable detail: o Design Data conversion tools and conversion strategies o Patterning Technologies (e-beam and laser) and key resolution and write time drivers o Advanced Mask Processing (Bake, Develop, Etch, CAR) o Mask Materials (NTAR, etc.) Other topics such as the application of SPC, signature matching, Phase Shifting Masks, and Imprint Templates will also be covered.