Direct laser writing commonly uses high numerical objective oil lens and femtosecond lasers to realize high precision micro-nano fabrication. Here we report a simple maskless lithography system utilizing a controllably designed high NA planar diffractive lens based on binary amplitude modulation and a diode laser at 405nm wavelength to realize submicron far-field lithography. The design procedure is based on vectorial Rayleigh-Sommerfeld diffraction integrals and genetic algorithm realized by Matlab programming language. The planar diffractive lens reported here can be designed to produce a tightly focused spot (~300-800nm) with an ultra-long depth of focus(~4μm) at a focal length of 1mm.
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