Scatterometry performance enhancement is demonstrated through a holistic approach by utilizing comprehensive information from various sources, including data from different process steps, different toolsets, multiple structures, and multiple optical channels using samples from magnetic hard disk drive manufacturing. Parameter and spectrum feed-forward are performed across multiple targets at the photo step and the photo results are fed forward to the post-reactive ion etch (RIE) step. For an isolated structure with critical dimensions (CD) much smaller than the incident light wavelengths, feed-forward methods improve CD correlation with a general improvement of 20 to 60% in precision and fleet measurement precision (FMP). A second technique examined is hybrid metrology, where inputs from source tools, such as CD-SEM and CD-AFM, are used to determine critical parameters. Hybridization of line edge roughness results in CD and sidewall angle (SWA) FMP improvement of ∼60%. We also demonstrate improved CD accuracy using azimuthal scatterometry at 0, 45, and 90 deg azimuth angles measuring resist lines with CD larger than the incident light wavelengths. FMP reductions of ∼60 and 30% are obtained for CD and SWA. SWA hybridization after RIE results in CD and SWA FMP improvements by >50 and 30%, respectively.
Optical critical dimension (OCD) metrology using scatterometry has been widely adopted for fast and non-destructive in-line process control and yield improvement. Recently there has been increased interest in metrology performance enhancement through a holistic approach. We investigate the benefits of feed-forward of metrology information from prior process steps using samples from magnetic hard disk drive manufacturing. The scatterometry targets are composed of rather isolated gratings that are designed to have better correlation with device features. Two gratings, one with pitch ≈ 10CD, and the other with pitch ≈ 15CD, are measured at post develop and post reactive ion etch (RIE) steps. Two methods: parameter feed-forward (PFF) and spectrum feedforward (SFF) are studied in which the measurement results or spectrum collected on the blanket target at photo step are fed forward to the measurements on the grating structures at post develop or post RIE step. Compared with standard measurement without FF, for the more isolated grating at photo step, both PFF and SFF improve CD correlation from R2=0.96 to R2=0.975 using CD-SEM results measured on device as the reference. Dynamic precision and fleet measurement precision are improved by 20-60%. For post RIE step, PFF and SFF significantly improve CD correlation from R2=0.95, slope=1.09 to R2=0.975, slope=1.03 for the denser grating, and from R2=0.90, slope=0.79 to R2=0.96, slope=0.96 for the more isolated grating. Dynamic precision is generally improved by 20-40%. It is observed that both PFF and SFF are equally efficient in reducing parameter correlation for the application studied here.
Reducing parameter correlations to enhance scatterometry measurement accuracy, precision and tool matching is a crucial component of every modeling effort. Parameter sensitivity can largely depend on the orientation of the plane of incidence relative to the grating orientation. Conventional scatterometry is done with the plane if incidence normal to the grating orientation, whereas azimuthal scatterometry allows measurements at an arbitrary angle or set of angles. A second technique examined in this paper is hybrid metrology where inputs from source tools such as CD-SEM and CD-AFM are used to determine values of critical parameters. The first examples shows LER sensitivity gains by measuring narrow resist lines in an orientation parallel with the long axis of the grating. Hybridization of LER results in a CD and SWA FMP improvement of about 60%. We also showcase the benefits of azimuthal scatterometry measuring resist lines with CD larger than the wavelengths of the incident light. A CD and SWA FMP reduction of about 60% and 30% is obtained using azimuthal scatterometry at 0, 45 and 90 degrees azimuth angles. Hybridization of the ARC SWA after RIE results in CD and resist SWA FMP improvements by over 60% and 30%, respectively.
Infrared astronomical instruments require absorptive coatings on internal surfaces to trap scattered and stray photons.
This is typically accomplished with any one of a number of black paints. Although inexpensive and simple to apply,
paint has several disadvantages. Painted surfaces can be fragile, prone to shedding particles, and difficult to clean. Most
importantly, the vacuum performance is poor. Recently a plasma enhanced chemical vapor deposition (PECVD) process
was developed to apply thick (30 μm) diamond-like carbon (DLC) based protective coatings to the interior of oil
pipelines. These DLC coatings show much promise as an infrared black for an ultra high vacuum environment. The
coatings are very robust with excellent cryogenic adhesion. Their total infrared reflectivity of < 10% at normal incidence
approaches that of black paints. We measured outgas rates of <10-12 Torr liter/sec cm2, comparable to bare stainless steel.
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