Karthik Boinapally
at Precitec
SPIE Involvement:
Author
Publications (4)

SPIE Journal Paper | 16 October 2014
Jie Li, Shahin Zangooie, Karthik Boinapally, Xi Zou, Jiangtao Hu, Zhuan Liu, Sanjay Yedur, Peter Wilkens, Avraham Ver, Robert Cohen, Babak Khamsehpour, Holger Schroder, John Piggot
JM3, Vol. 13, Issue 04, 041406, (October 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.4.041406
KEYWORDS: Critical dimension metrology, Scatterometry, Line edge roughness, Reactive ion etching, Metrology, Scatter measurement, Semiconducting wafers, Optics manufacturing, Magnetism, Etching

Proceedings Article | 2 April 2014 Paper
Jie Li, Shahin Zangooie, Karthik Boinapally, Xi Zou, Jiangtao Hu, Zhuan Liu, Sanjay Yedur, Peter Wilkens, Avraham Ver, Robert Cohen, Babak Khamsepour
Proceedings Volume 9050, 90502T (2014) https://doi.org/10.1117/12.2046639
KEYWORDS: Reactive ion etching, Scatterometry, Critical dimension metrology, Metrology, Magnetism, Manufacturing, Photomasks, Etching, Measurement devices, Semiconducting wafers

Proceedings Article | 2 April 2014 Paper
Shahin Zangooie, Jie Li, Karthik Boinapally, Peter Wilkens, Avraham Ver, Babak Khamsepour, Holger Schroder, John Piggot, Sanjay Yedur, Zhuan Liu, Jiangtao Hu
Proceedings Volume 9050, 90501G (2014) https://doi.org/10.1117/12.2046165
KEYWORDS: Scatterometry, Critical dimension metrology, Line edge roughness, Scatter measurement, Semiconducting wafers, Metrology, Reactive ion etching, Manufacturing, Ellipsometry, Data modeling

Proceedings Article | 23 July 2008 Paper
Paul Kuzmenko, Daniel Behne, T. Casserly, W. Boardman, D. Upadhyaya, K. Boinapally, M. Gupta, Y. Cao
Proceedings Volume 7018, 701852 (2008) https://doi.org/10.1117/12.788006
KEYWORDS: Coating, Reflectivity, Infrared radiation, Cryogenics, Plasma, Photons, Infrared coatings, Plasma enhanced chemical vapor deposition, Sensors, Carbon monoxide

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