In this study, performance improvement of an i-line laser writer used in the manufacture of masks for photonic device applications was successfully achieved and demonstrated. This was accomplished by conducting a thorough investigation and analysis of key lithographic performance characteristics, enabling the identification of optimal exposure strategies. Subsequent process characterization and design calibration was then performed using software tools. To assess improvement, a side-by-side comparison of performance was made between two identical silicon nitride photonic devices: one fabricated by a mask made using the improved laser writer process, the other by a mask written using a variable shaped electron beam writer. These devices were compared for optical loss to assess mask performance. This study demonstrates that the improved laser writer process enables the production of masks capable of infrared silicon nitride photonic device manufacture. This presents an opportunity in reducing the mask manufacturing costs involved in the fabrication of photonic devices.
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