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Min Tsao
at Mentor, a Siemens Business
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Publications (1)
Proceedings Article | 19 September 2018 Paper
Maximizing utilization of large-scale mask data preparation clusters
Proceedings Volume 10775, 1077513 (2018) https://doi.org/10.1117/12.2326553
KEYWORDS: Optical proximity correction, Lithography, Photomasks, Visualization, Manufacturing, Network architectures, Electronic design automation, Operating systems
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