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Nadja Heidensohn
at micro resist technology GmbH
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Publications (1)
Proceedings Article | 9 April 2024 Presentation + Paper
Novel multi-layer nanoimprint lithography material system enabling nano-patterning of functional optical layers
M. Messerschmidt, M. Lohse, N. Heidensohn, S. Grützner, A. Schleunitz, A. Voigt, G. Grützner
Proceedings Volume 12956, 1295607 (2024) https://doi.org/10.1117/12.3010840
KEYWORDS: Etching, Nanoimprint lithography, Metals, Fabrication, Plasma, Photoresist processing, Coating, Reactive ion etching, Oxygen, Coating thickness
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