Olha Sysova
at CNRS UMR7361 IS2M
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 1 May 2023 Presentation + Paper
Proceedings Volume 12498, 1249818 (2023) https://doi.org/10.1117/12.2658423
KEYWORDS: Semiconducting wafers, Silicon, Deep ultraviolet, Lithography, Photoacid generators, Photoresist processing, Plasma etching, Etching, Optical lithography, Film thickness, Sustainability

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