Mr. Omar Zurita Profile

Omar Zurita

at Cymer LLC

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Author

Publications (7)

Proceedings Article | 25 March 2020 Presentation

Multi-focal imaging for improved depth of focus; principles and application to ArFi use cases (Conference Presentation)

Will Conley, Josh Thornes, Paolo Alagna, Omar Zurita, Kuo-Tai Teng, Stephen Hsu, Xiang-ru Xu, Sam Liu

Proceedings Volume 11327, 113270P (2020) https://doi.org/10.1117/12.2552505

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Over the years, lithography engineers have continued to focus on CD control, overlay and process capability to meet node requirements for yield and device performance. The use of ArFi lithography for advanced process nodes demands challenging patterning budget improvements in the sub-nm range.1 In 3D NAND devices, the height differences between the cell and periphery create issues with the ability to adequately image and maintain a useable process window in both regions. Previous work by Fukuda2 developed a multi-exposure technique at multi-focus positions to image contact holes with adequate DOF. Lalovic3 demonstrated a fixed 2 wavelength technique to improve DOF called RELAX. ASML introduced EFESE Rx, a method of tilting the stage during exposure to create multiple focus positions and finally Lalovic4 introduced a broadband laser solution to provide additional DOF. All of these techniques suffered from a number of problems that limited usability. In this work the authors will introduce a new method to increase DOF through alternating wavelength’s from an ArFi light source. This technique, called MFI (multi-focal imaging), can be tuned specifically to provide the required amount of wavelength separation for a specific DOF need. Two focal positions are created that are averaged over the exposure field. The authors will review this wavelength “dithering” approach which can be turned on and off, thus eliminating any potential scanner calibration issues. Initial simulation studies with a fixed source and mask indicated increased DOF with wavelength separation. These DOF improvements have been confirmed with on-wafer single-exposure data. The Tachyon MFI aware engine flow will be reviewed using several customer use cases that have been analyzed to demonstrate maximum DOF and ILS vs wavelength separation. The authors will also review the optimization of new pupils and OPC solutions that are unique with each wavelength separation case and maximize process capability. The presentation will close with a product availability timeline and roadmap.

Proceedings Article | 4 September 2015 Paper

Advanced process characterization of a 10nm Metal 1 Logic layer using light source modulation and monitoring

Paolo Alagna, Omar Zurita, Vadim Timoshkov, Patrick Wong, Greg Rechtsteiner, Jan Baselmans, Julien Mailfert, Will Conley, Simon Hsieh

Proceedings Volume 9661, 966105 (2015) https://doi.org/10.1117/12.2196862

KEYWORDS: Light sources, Semiconducting wafers, Optical lithography, Critical dimension metrology, Logic, Line width roughness, Optical proximity correction, Metals, Scanners, Modulation

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Proceedings Article | 18 March 2015 Paper

Optimum ArFi laser bandwidth for 10nm node logic imaging performance

Paolo Alagna, Omar Zurita, Vadim Timoshkov, Patrick Wong, Gregory Rechtsteiner, Jan Baselmans, Julien Mailfert

Proceedings Volume 9426, 942609 (2015) https://doi.org/10.1117/12.2085823

KEYWORDS: Optical lithography, Logic, Semiconducting wafers, Line width roughness, Light sources, Photomasks, Optical proximity correction, Lithography, Process control, Critical dimension metrology

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Proceedings Article | 18 March 2015 Paper

Advanced process characterization using light source performance modulation and monitoring

Paolo Alagna, Omar Zurita, Gregory Rechtsteiner

Proceedings Volume 9426, 94261D (2015) https://doi.org/10.1117/12.2085838

KEYWORDS: Optical lithography, Modulation, Light sources, Semiconducting wafers, Lithography, Wafer-level optics, Neodymium, Light, Polarization, Metrology

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Proceedings Article | 4 April 2014 Paper

Improving on-wafer CD correlation analysis using advanced diagnostics and across-wafer light-source monitoring

Paolo Alagna, Omar Zurita, Gregory Rechtsteiner, Ivan Lalovic, Joost Bekaert

Proceedings Volume 9052, 905228 (2014) https://doi.org/10.1117/12.2047449

KEYWORDS: Semiconducting wafers, Optical lithography, Critical dimension metrology, Modulation, Lithography, Metrology, Wafer-level optics, Scatterometry, Double patterning technology, Photomasks

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Proceedings Article | 12 April 2013 Paper

Lithography imaging control by enhanced monitoring of light source performance

Paolo Alagna, Omar Zurita, Ivan Lalovic, Nakgeuon Seong, Gregory Rechsteiner, Joshua Thornes, Koen D'havé, Lieve Van Look , Joost Bekaert

Proceedings Volume 8683, 86830S (2013) https://doi.org/10.1117/12.2013213

KEYWORDS: Semiconducting wafers, Lithography, Optical lithography, Metrology, Polarization, Light sources, Critical dimension metrology, Scanners, Control systems, Lithographic illumination

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Proceedings Article | 13 March 2012 Paper

Enhancing lithography process control through advanced, on-board beam parameter metrology for wafer level monitoring of light source parameters

Jinphil Choi, Nakgeuon Seong, Omar Zurita, Joshua Thornes, Yookeun Won, Slava Rokitski, Youngseog Kang, Bernd Burfeindt, Chanhoon Park

Proceedings Volume 8326, 83262O (2012) https://doi.org/10.1117/12.917900

KEYWORDS: Semiconducting wafers, Metrology, Light sources, Process control, Lithography, Critical dimension metrology, Light, Laser metrology, Optical lithography, Lithographic illumination

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Showing 5 of 7 publications

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