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Dr. Rudolf Hendel
Managing Partner at Lithoptek LLC
SPIE Involvement:
Author
Publications (1)
Proceedings Article | 18 March 2009 Paper
Interference assisted lithography for patterning of 1D gridded design
Proceedings Volume 7271, 72712U (2009) https://doi.org/10.1117/12.812033
KEYWORDS: Lithography, Diffusion, Photomasks, Critical dimension metrology, Optical lithography, 193nm lithography, Double patterning technology, Logic, Metals, Electron beam lithography
Conference Committee Involvement (1)
SPIE Advanced Lithography
21 February 2010 | San Jose, United States
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