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Sean Pursel
at Intel Corp
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Publications (1)
Proceedings Article | 10 April 2024 Presentation
DSA materials and processes development for ≤ P24 EUV resist L/S pattern rectification
Eungnak Han, Gurpreet Singh, Tayseer Mahdi, Robert Seidel, Sandra Murcia, Lauren Doyle, Nityan Nair, Nafees Kabir, Sean Pursel, David Shykind, Todd Hoppe, Florian Gstrein
Proceedings Volume PC12956, PC129560P (2024) https://doi.org/10.1117/12.3012612
KEYWORDS: Directed self assembly, Extreme ultraviolet, Materials processing, Extreme ultraviolet lithography, Block copolymers, Surface roughness, Scanners, Optical lithography, Objectives, Fabrication
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