CONFERENCE PROCEEDINGS
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Takahiro Sakaguchi
at Nissan Chemical Corp
SPIE Involvement:
Author
Publications (5)
Proceedings Article | 2 April 2007 Paper
Multilayer BARCs for hyper-NA immersion lithography process
Yasushi Sakaida, Makoto Nakajima, Shigeo Kimura, Takahiro Sakaguchi, Keisuke Hashimoto, Hikaru Imamura
Proceedings Volume 6519, 65192A (2007) https://doi.org/10.1117/12.711382
KEYWORDS: System on a chip, Etching, Silicon, Reflectivity, Lithography, Immersion lithography, Photoresist processing, Reflection, Sensors, Semiconducting wafers
Proceedings Article | 20 October 2006 Paper
Multi-layer resist system for 45-nm-node and beyond: Part II
Yukihiro Fujimura, Jumpei Morimoto, Asuka Manoshiro, Mochihiro Shimizu, Hideyoshi Takamizawa, Masahiro Hashimoto, Hiroshi Shiratori, Katsuhiko Horii, Yasunori Yokoya, Yasushi Ohkubo, Tomoyuki Enomoto, Takahiro Sakaguchi, Masaki Nagai
Proceedings Volume 6349, 634936 (2006) https://doi.org/10.1117/12.692896
KEYWORDS: Etching, Dry etching, Resistance, Photoresist processing, Coating, Photomasks, Chromium, Fluorine, Ultraviolet radiation, Scanning electron microscopy
Proceedings Article | 11 April 2006 Paper
Design and development of next-generation bottom anti-reflective coatings for 45nm process with hyper NA lithography
Makoto Nakajima, Takahiro Sakaguchi, Keisuke Hashimoto, Rikimaru Sakamoto, Takahiro Kishioka, Satoshi Takei, Tomoyuki Enomoto, Yasuyuki Nakajima
Proceedings Volume 6153, 61532L (2006) https://doi.org/10.1117/12.656132
KEYWORDS: System on a chip, Etching, Photoresist processing, Lithography, Photomasks, Silicon, Semiconducting wafers, Reflectivity, Bottom antireflective coatings, Carbon
Proceedings Article | 4 May 2005 Paper
Optimization of 248nm bottom anti-reflective coatings with thin film and high etch rate on real device
MyoungSoo Kim, HakJoon Kim, KewChan Shim, JeHa Jeon, MyungGoon Gil, YongWook Song, Tomoyuki Enomoto, Takahiro Sakaguchi, Yasuyuki Nakajima
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599434
KEYWORDS: Reflectivity, Photoresist materials, Silicon, Etching, Semiconducting wafers, Coating, Oxides, Thin films, Plasma etching, Semiconductors
Proceedings Article | 4 May 2005 Paper
Bottom anti-reflective coatings for 193-nm bilayer system
Takahiro Sakaguchi, Tomoyuki Enomoto, Yasuyuki Nakajima
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.598715
KEYWORDS: Silicon, Photoresist materials, Reflectivity, Etching, Oxides, Semiconducting wafers, Bottom antireflective coatings, Photoresist developing, Resistance, Silica
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