Valentina Dall'Asta
at STMicroelectronics SRL
SPIE Involvement:
Author
Area of Expertise:
nanotechnologies , lithography , 300mm silicon manufacturing , electrochemistry , photomasks , photomaterials
Profile Summary

Valentina Dall'Asta received her Master's Degree with a dissertation in Physical Chemistry in 2015, at the University of Pavia and she was awarded as "Best Graduate Student of the Year 2015 in Chemistry" by UBI Bank.
She dedicated two years to the research of new battery-related nanotechnologies and thanks to an assignment to the HIU (Helmholtz Institut Ulm) in Southern Germany, she improved her electrochemistry knowledge especially regarding Lithium, Sodium and Aluminum batteries.
In 2017, she joined the Lithography Process and Development team at STMicroelectronics Agrate (Italy), as Process Engineer and she is currently covering this role. Meanwhile, thanks to a one-year assignment at STMicroelectronics Crolles (France) she had the opportunity to learn the manufacturing dynamics at 300mm.
In May 2020, she started a PhD Executive Project entitled "Yield detractors in the semiconductor devices manufacturing industry: patterning issues and challenges in 200mm and 300mm fabs" that deals with the resolution of Si-manufacturing issues like, the flattening of etched surfaces, the haze-related defectiveness and the Aluminum corrosions.
Thanks to her experiences abroad, she speaks fluently English, French and she has a basic level in German.
She is author/co-author of 11 publications (both in the fields of electrochemistry and lithography) and she has joined several congresses and workshop contributing with oral presentations.



Publications (4)

Proceedings Article | 25 May 2022 Poster + Paper
Proceedings Volume 12055, 120550W (2022) https://doi.org/10.1117/12.2614005
KEYWORDS: Semiconducting wafers, Lithography, Silicon, Reflectivity, Photoresist materials, Photomasks, Scanning electron microscopy, Photomicroscopy

Proceedings Article | 22 February 2021 Presentation + Paper
Proceedings Volume 11612, 116120E (2021) https://doi.org/10.1117/12.2583933
KEYWORDS: Lithography, Chemistry, Yield improvement, Semiconductor manufacturing, Semiconducting wafers, Reliability, Photosensitive materials, Photoresist materials, Manufacturing

Proceedings Article | 23 March 2020 Paper
Proceedings Volume 11326, 1132622 (2020) https://doi.org/10.1117/12.2551864
KEYWORDS: System on a chip, Semiconducting wafers, Coating, Polymers, Liquids, Lithography, Scanning electron microscopy, Photoresist materials

Proceedings Article | 20 March 2019 Paper
Proceedings Volume 10962, 1096213 (2019) https://doi.org/10.1117/12.2514722
KEYWORDS: Semiconducting wafers, Coating, Polymers, Scanning electron microscopy, Photomasks, Silicon, Lithography, Optical microscopy

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