Mr. Zhong-Geng Ling Profile

Zhong-Geng Ling

at Louisiana State Univ

SPIE Involvement:

Author

Publications (13)

Proceedings Article | 23 January 2006 Paper

An injection micromixer fabricated by improved SU-8 processing for biochemical microfluidic systems

Changgeng Liu, Zhong-geng Ling, Kun Lian, Jost Goettert, Josef Hormes

Proceedings Volume 6112, 61120G (2006) https://doi.org/10.1117/12.646049

KEYWORDS: Microfluidics, Liquids, Coating, Polymethylmethacrylate, Manufacturing, Silicon, Photoresist materials, Resistance, Diffusion, Biosensors

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Proceedings Article | 22 January 2005 Paper

Interconnected multilevel microfluidic channels fabricated using low-temperature bonding of SU-8 and multilayer lithography

Zheng-Chun Peng, Zhong-Geng Ling, Jost Goettert, Josef Hormes, Kun Lian

Proceedings Volume 5718, (2005) https://doi.org/10.1117/12.592244

KEYWORDS: Microfluidics, Lithography, Semiconducting wafers, Photomasks, Silicon, Neodymium, Polymers, Liquids, Ultraviolet radiation, Wafer bonding

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Proceedings Article | 30 December 2003 Paper

Fabrication of large-area x-rays masks for UDXRL on beryllium using thin film UV lithography and x-ray backside exposure

Josef Kouba, Zhong-Geng Ling, Lin Wang, Yohannes Desta, Jost Goettert

Proceedings Volume 5342, (2003) https://doi.org/10.1117/12.531598

KEYWORDS: Gold, X-rays, Photomasks, X-ray lithography, Beryllium, Plating, Ultraviolet radiation, Lithography, Photoresist materials, Photoresist processing

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Proceedings Article | 16 January 2003 Paper

Temperature effects on microstructural evolution and resulting surface mechanical properties of Ni-based MEMS structures

Kun Lian, Jiechao Jiang, Zhong Ling, Efstathios Meletis

Proceedings Volume 4980, (2003) https://doi.org/10.1117/12.478193

KEYWORDS: Nickel, Annealing, Microelectromechanical systems, Transmission electron microscopy, Photomicroscopy, Scanning electron microscopy, Plating, Temperature metrology, Mechanical engineering, Polishing

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Proceedings Article | 16 January 2003 Paper

Thermal stability of SU-8 fabricated microstructures as a function of photo initiator and exposure doses

Kun Lian, Zhong-geng Ling, Changgeng Liu

Proceedings Volume 4980, (2003) https://doi.org/10.1117/12.478197

KEYWORDS: Temperature metrology, Photoresist materials, Microelectromechanical systems, Ultraviolet radiation, Microopto electromechanical systems, Epoxies, Polymerization, Lithography, Thermal analysis, Particles

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Proceedings Article | 15 January 2003 Paper

New process to fabricate DXRL x-ray mask by direct pattern writing

Zhong Ling, Kun Lian, Shirong Wen

Proceedings Volume 4979, (2003) https://doi.org/10.1117/12.478253

KEYWORDS: Photomasks, Gold, X-rays, X-ray lithography, Plating, X-ray optics, UV optics, Ultraviolet radiation, Mask making, Mirrors

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Proceedings Article | 15 January 2003 Paper

High-aspect-ratio microstructures for magnetoelectronic applications

Tao Wang, Andrew McCandless, Sean Ford, Kevin Kelly, Richard Lienau, Dale Hensley, Yohannes Desta, Zhong-geng Ling

Proceedings Volume 4979, (2003) https://doi.org/10.1117/12.472792

KEYWORDS: X-rays, Gold, Photomasks, Etching, Semiconducting wafers, Polymethylmethacrylate, Silicon, X-ray lithography, Plating, Ultraviolet radiation

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Proceedings Article | 15 January 2003 Paper

Expansion of SU-8 application scope by PAG concentration modification

Zhong-geng Ling, Kun Lian

Proceedings Volume 4979, (2003) https://doi.org/10.1117/12.478254

KEYWORDS: Ultraviolet radiation, X-ray lithography, Lithography, Absorption, X-rays, Semiconducting wafers, Photomasks, Photoresist materials, X-ray optics, 3D microstructuring

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Proceedings Article | 11 August 2000 Paper

Passive alignment and its application in multilevel x-ray lithography

Zhong Ling, Kun Lian, Jost Goettert

Proceedings Volume 4175, (2000) https://doi.org/10.1117/12.395611

KEYWORDS: Photomasks, Optical alignment, X-ray lithography, X-ray optics, X-rays, Semiconducting wafers, Glasses, Quartz, Error analysis, Silicon

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Proceedings Article | 23 June 2000 Paper

Improved patterning quality of SU-8 microstructures by optimizing the exposure parameters

Zhong Ling, Kun Lian, Linke Jian

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388266

KEYWORDS: Absorption, Ultraviolet radiation, Scanning electron microscopy, Coating, Ultraviolet sources, Optical lithography, Near ultraviolet, Microelectromechanical systems, Photomasks, Photoresist processing

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Proceedings Article | 9 May 2000 Paper

Miniaturized tin oxide (SnOx) sensor by using oxygen-plasma-treated thin film technique

Kun Lian, Zhong Ling, Jiechao Jiang

Proceedings Volume 4077, (2000) https://doi.org/10.1117/12.385525

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Proceedings Article | 10 April 2000 Paper

Preliminary results at the ultradeep x-ray lithography beamline at CAMD

Georg Aigeldinger, Philip Coane, Benjamin Craft, Jost Goettert, Sam Ledger, Zhong Ling, Harish Manohara, Louis Rupp

Proceedings Volume 4019, (2000) https://doi.org/10.1117/12.382294

KEYWORDS: Photomasks, Polymethylmethacrylate, X-ray lithography, X-rays, Gold, Beryllium, Optical filters, Scanning electron microscopy, Teeth, Microfabrication

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Proceedings Article | 13 September 1996 Paper

Multiexposure capability development for deep x-ray lithography for MEMS

Chantal Khan Malek, Robert Wood, Bruce Dudley, Zhong Ling, Volker Saile

Proceedings Volume 2880, (1996) https://doi.org/10.1117/12.250947

KEYWORDS: Optical alignment, Photomasks, X-rays, Semiconducting wafers, X-ray lithography, X-ray optics, Transmittance, Silicon, Microelectromechanical systems, Prototyping

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Showing 5 of 13 publications

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